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Bibliographic details for 18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)

Citation styles for 18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)

APA style

18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.). (2024, May 8). WikiPatents, . Retrieved 10:42, June 16, 2024 from http://wikipatents.org/index.php?title=18405099._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=59003.

MLA style

"18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)." WikiPatents, . 8 May 2024, 06:23 UTC. 16 Jun 2024, 10:42 <http://wikipatents.org/index.php?title=18405099._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=59003>.

MHRA style

WikiPatents contributors, '18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)', WikiPatents, , 8 May 2024, 06:23 UTC, <http://wikipatents.org/index.php?title=18405099._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=59003> [accessed 16 June 2024]

Chicago style

WikiPatents contributors, "18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=18405099._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=59003 (accessed June 16, 2024).

CBE/CSE style

WikiPatents contributors. 18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) [Internet]. WikiPatents, ; 2024 May 8, 06:23 UTC [cited 2024 Jun 16]. Available from: http://wikipatents.org/index.php?title=18405099._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=59003.

Bluebook style

18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.), http://wikipatents.org/index.php?title=18405099._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=59003 (last visited June 16, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18405099._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=59003",
   note = "[Online; accessed 16-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18405099._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=59003}",
   note = "[Online; accessed 16-June-2024]"
 }


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