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Bibliographic details for 18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- Page name: 18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- Author: WikiPatents contributors
- Publisher: WikiPatents, .
- Date of last revision: 8 May 2024 06:23 UTC
- Date retrieved: 25 June 2024 07:20 UTC
- Permanent URL: http://wikipatents.org/index.php?title=18405099._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=59003
- Page Version ID: 59003
Citation styles for 18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
APA style
18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.). (2024, May 8). WikiPatents, . Retrieved 07:20, June 25, 2024 from http://wikipatents.org/index.php?title=18405099._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=59003.
MLA style
"18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)." WikiPatents, . 8 May 2024, 06:23 UTC. 25 Jun 2024, 07:20 <http://wikipatents.org/index.php?title=18405099._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=59003>.
MHRA style
WikiPatents contributors, '18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)', WikiPatents, , 8 May 2024, 06:23 UTC, <http://wikipatents.org/index.php?title=18405099._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=59003> [accessed 25 June 2024]
Chicago style
WikiPatents contributors, "18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=18405099._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=59003 (accessed June 25, 2024).
CBE/CSE style
WikiPatents contributors. 18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) [Internet]. WikiPatents, ; 2024 May 8, 06:23 UTC [cited 2024 Jun 25]. Available from: http://wikipatents.org/index.php?title=18405099._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=59003.
Bluebook style
18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.), http://wikipatents.org/index.php?title=18405099._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=59003 (last visited June 25, 2024).
BibTeX entry
@misc{ wiki:xxx, author = "WikiPatents", title = "18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ", year = "2024", url = "http://wikipatents.org/index.php?title=18405099._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=59003", note = "[Online; accessed 25-June-2024]" }
When using the LaTeX package url (\usepackage{url}
somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:
@misc{ wiki:xxx, author = "WikiPatents", title = "18405099. PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ", year = "2024", url = "\url{http://wikipatents.org/index.php?title=18405099._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=59003}", note = "[Online; accessed 25-June-2024]" }