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Bibliographic details for 18153912. LOW-STRESS PASSIVATION LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- Page name: 18153912. LOW-STRESS PASSIVATION LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- Author: WikiPatents contributors
- Publisher: WikiPatents, .
- Date of last revision: 8 May 2024 06:21 UTC
- Date retrieved: 20 June 2024 12:05 UTC
- Permanent URL: http://wikipatents.org/index.php?title=18153912._LOW-STRESS_PASSIVATION_LAYER_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=58994
- Page Version ID: 58994
Citation styles for 18153912. LOW-STRESS PASSIVATION LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
APA style
18153912. LOW-STRESS PASSIVATION LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.). (2024, May 8). WikiPatents, . Retrieved 12:05, June 20, 2024 from http://wikipatents.org/index.php?title=18153912._LOW-STRESS_PASSIVATION_LAYER_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=58994.
MLA style
"18153912. LOW-STRESS PASSIVATION LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)." WikiPatents, . 8 May 2024, 06:21 UTC. 20 Jun 2024, 12:05 <http://wikipatents.org/index.php?title=18153912._LOW-STRESS_PASSIVATION_LAYER_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=58994>.
MHRA style
WikiPatents contributors, '18153912. LOW-STRESS PASSIVATION LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)', WikiPatents, , 8 May 2024, 06:21 UTC, <http://wikipatents.org/index.php?title=18153912._LOW-STRESS_PASSIVATION_LAYER_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=58994> [accessed 20 June 2024]
Chicago style
WikiPatents contributors, "18153912. LOW-STRESS PASSIVATION LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=18153912._LOW-STRESS_PASSIVATION_LAYER_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=58994 (accessed June 20, 2024).
CBE/CSE style
WikiPatents contributors. 18153912. LOW-STRESS PASSIVATION LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) [Internet]. WikiPatents, ; 2024 May 8, 06:21 UTC [cited 2024 Jun 20]. Available from: http://wikipatents.org/index.php?title=18153912._LOW-STRESS_PASSIVATION_LAYER_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=58994.
Bluebook style
18153912. LOW-STRESS PASSIVATION LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.), http://wikipatents.org/index.php?title=18153912._LOW-STRESS_PASSIVATION_LAYER_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=58994 (last visited June 20, 2024).
BibTeX entry
@misc{ wiki:xxx,
author = "WikiPatents",
title = "18153912. LOW-STRESS PASSIVATION LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ",
year = "2024",
url = "http://wikipatents.org/index.php?title=18153912._LOW-STRESS_PASSIVATION_LAYER_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=58994",
note = "[Online; accessed 20-June-2024]"
}
When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:
@misc{ wiki:xxx,
author = "WikiPatents",
title = "18153912. LOW-STRESS PASSIVATION LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ",
year = "2024",
url = "\url{http://wikipatents.org/index.php?title=18153912._LOW-STRESS_PASSIVATION_LAYER_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=58994}",
note = "[Online; accessed 20-June-2024]"
}
