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Bibliographic details for 18332238. MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

Citation styles for 18332238. MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

APA style

18332238. MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.). (2024, April 26). WikiPatents, . Retrieved 06:23, June 26, 2024 from http://wikipatents.org/index.php?title=18332238._MULTI-WAVELENGTH_SELECTION_METHOD_FOR_OVERLAY_MEASUREMENT,_AND_OVERLAY_MEASUREMENT_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_USING_MULTI-WAVELENGTHS_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=57378.

MLA style

"18332238. MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)." WikiPatents, . 26 Apr 2024, 05:04 UTC. 26 Jun 2024, 06:23 <http://wikipatents.org/index.php?title=18332238._MULTI-WAVELENGTH_SELECTION_METHOD_FOR_OVERLAY_MEASUREMENT,_AND_OVERLAY_MEASUREMENT_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_USING_MULTI-WAVELENGTHS_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=57378>.

MHRA style

WikiPatents contributors, '18332238. MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)', WikiPatents, , 26 April 2024, 05:04 UTC, <http://wikipatents.org/index.php?title=18332238._MULTI-WAVELENGTH_SELECTION_METHOD_FOR_OVERLAY_MEASUREMENT,_AND_OVERLAY_MEASUREMENT_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_USING_MULTI-WAVELENGTHS_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=57378> [accessed 26 June 2024]

Chicago style

WikiPatents contributors, "18332238. MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)," WikiPatents, , http://wikipatents.org/index.php?title=18332238._MULTI-WAVELENGTH_SELECTION_METHOD_FOR_OVERLAY_MEASUREMENT,_AND_OVERLAY_MEASUREMENT_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_USING_MULTI-WAVELENGTHS_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=57378 (accessed June 26, 2024).

CBE/CSE style

WikiPatents contributors. 18332238. MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) [Internet]. WikiPatents, ; 2024 Apr 26, 05:04 UTC [cited 2024 Jun 26]. Available from: http://wikipatents.org/index.php?title=18332238._MULTI-WAVELENGTH_SELECTION_METHOD_FOR_OVERLAY_MEASUREMENT,_AND_OVERLAY_MEASUREMENT_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_USING_MULTI-WAVELENGTHS_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=57378.

Bluebook style

18332238. MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.), http://wikipatents.org/index.php?title=18332238._MULTI-WAVELENGTH_SELECTION_METHOD_FOR_OVERLAY_MEASUREMENT,_AND_OVERLAY_MEASUREMENT_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_USING_MULTI-WAVELENGTHS_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=57378 (last visited June 26, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18332238. MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18332238._MULTI-WAVELENGTH_SELECTION_METHOD_FOR_OVERLAY_MEASUREMENT,_AND_OVERLAY_MEASUREMENT_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_USING_MULTI-WAVELENGTHS_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=57378",
   note = "[Online; accessed 26-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18332238. MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18332238._MULTI-WAVELENGTH_SELECTION_METHOD_FOR_OVERLAY_MEASUREMENT,_AND_OVERLAY_MEASUREMENT_METHOD_AND_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_USING_MULTI-WAVELENGTHS_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=57378}",
   note = "[Online; accessed 26-June-2024]"
 }


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