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Bibliographic details for 18522942. PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)

Citation styles for 18522942. PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)

APA style

18522942. PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.). (2024, March 22). WikiPatents, . Retrieved 13:20, June 27, 2024 from http://wikipatents.org/index.php?title=18522942._PHOTOMASK_INCLUDING_FIDUCIAL_MARK_AND_METHOD_OF_MAKING_A_PHOTOMASK_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=41746.

MLA style

"18522942. PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)." WikiPatents, . 22 Mar 2024, 08:16 UTC. 27 Jun 2024, 13:20 <http://wikipatents.org/index.php?title=18522942._PHOTOMASK_INCLUDING_FIDUCIAL_MARK_AND_METHOD_OF_MAKING_A_PHOTOMASK_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=41746>.

MHRA style

WikiPatents contributors, '18522942. PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)', WikiPatents, , 22 March 2024, 08:16 UTC, <http://wikipatents.org/index.php?title=18522942._PHOTOMASK_INCLUDING_FIDUCIAL_MARK_AND_METHOD_OF_MAKING_A_PHOTOMASK_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=41746> [accessed 27 June 2024]

Chicago style

WikiPatents contributors, "18522942. PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=18522942._PHOTOMASK_INCLUDING_FIDUCIAL_MARK_AND_METHOD_OF_MAKING_A_PHOTOMASK_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=41746 (accessed June 27, 2024).

CBE/CSE style

WikiPatents contributors. 18522942. PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) [Internet]. WikiPatents, ; 2024 Mar 22, 08:16 UTC [cited 2024 Jun 27]. Available from: http://wikipatents.org/index.php?title=18522942._PHOTOMASK_INCLUDING_FIDUCIAL_MARK_AND_METHOD_OF_MAKING_A_PHOTOMASK_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=41746.

Bluebook style

18522942. PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.), http://wikipatents.org/index.php?title=18522942._PHOTOMASK_INCLUDING_FIDUCIAL_MARK_AND_METHOD_OF_MAKING_A_PHOTOMASK_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=41746 (last visited June 27, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18522942. PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18522942._PHOTOMASK_INCLUDING_FIDUCIAL_MARK_AND_METHOD_OF_MAKING_A_PHOTOMASK_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=41746",
   note = "[Online; accessed 27-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18522942. PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18522942._PHOTOMASK_INCLUDING_FIDUCIAL_MARK_AND_METHOD_OF_MAKING_A_PHOTOMASK_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=41746}",
   note = "[Online; accessed 27-June-2024]"
 }


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