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Bibliographic details for 20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.)

Citation styles for 20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.)

APA style

20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.). (2024, March 20). WikiPatents, . Retrieved 12:57, June 27, 2024 from http://wikipatents.org/index.php?title=20240085778.PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(samsung_electronics_co.,_ltd.)&oldid=39543.

MLA style

"20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.)." WikiPatents, . 20 Mar 2024, 02:04 UTC. 27 Jun 2024, 12:57 <http://wikipatents.org/index.php?title=20240085778.PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(samsung_electronics_co.,_ltd.)&oldid=39543>.

MHRA style

WikiPatents contributors, '20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.)', WikiPatents, , 20 March 2024, 02:04 UTC, <http://wikipatents.org/index.php?title=20240085778.PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(samsung_electronics_co.,_ltd.)&oldid=39543> [accessed 27 June 2024]

Chicago style

WikiPatents contributors, "20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=20240085778.PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(samsung_electronics_co.,_ltd.)&oldid=39543 (accessed June 27, 2024).

CBE/CSE style

WikiPatents contributors. 20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.) [Internet]. WikiPatents, ; 2024 Mar 20, 02:04 UTC [cited 2024 Jun 27]. Available from: http://wikipatents.org/index.php?title=20240085778.PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(samsung_electronics_co.,_ltd.)&oldid=39543.

Bluebook style

20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.), http://wikipatents.org/index.php?title=20240085778.PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(samsung_electronics_co.,_ltd.)&oldid=39543 (last visited June 27, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=20240085778.PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(samsung_electronics_co.,_ltd.)&oldid=39543",
   note = "[Online; accessed 27-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=20240085778.PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(samsung_electronics_co.,_ltd.)&oldid=39543}",
   note = "[Online; accessed 27-June-2024]"
 }


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