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Bibliographic details for 20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.)
- Page name: 20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.)
- Author: WikiPatents contributors
- Publisher: WikiPatents, .
- Date of last revision: 20 March 2024 02:04 UTC
- Date retrieved: 30 June 2024 02:46 UTC
- Permanent URL: http://wikipatents.org/index.php?title=20240085778.PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(samsung_electronics_co.,_ltd.)&oldid=39543
- Page Version ID: 39543
Citation styles for 20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.)
APA style
20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.). (2024, March 20). WikiPatents, . Retrieved 02:46, June 30, 2024 from http://wikipatents.org/index.php?title=20240085778.PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(samsung_electronics_co.,_ltd.)&oldid=39543.
MLA style
"20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.)." WikiPatents, . 20 Mar 2024, 02:04 UTC. 30 Jun 2024, 02:46 <http://wikipatents.org/index.php?title=20240085778.PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(samsung_electronics_co.,_ltd.)&oldid=39543>.
MHRA style
WikiPatents contributors, '20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.)', WikiPatents, , 20 March 2024, 02:04 UTC, <http://wikipatents.org/index.php?title=20240085778.PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(samsung_electronics_co.,_ltd.)&oldid=39543> [accessed 30 June 2024]
Chicago style
WikiPatents contributors, "20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=20240085778.PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(samsung_electronics_co.,_ltd.)&oldid=39543 (accessed June 30, 2024).
CBE/CSE style
WikiPatents contributors. 20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.) [Internet]. WikiPatents, ; 2024 Mar 20, 02:04 UTC [cited 2024 Jun 30]. Available from: http://wikipatents.org/index.php?title=20240085778.PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(samsung_electronics_co.,_ltd.)&oldid=39543.
Bluebook style
20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.), http://wikipatents.org/index.php?title=20240085778.PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(samsung_electronics_co.,_ltd.)&oldid=39543 (last visited June 30, 2024).
BibTeX entry
@misc{ wiki:xxx, author = "WikiPatents", title = "20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.) --- WikiPatents{,} ", year = "2024", url = "http://wikipatents.org/index.php?title=20240085778.PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(samsung_electronics_co.,_ltd.)&oldid=39543", note = "[Online; accessed 30-June-2024]" }
When using the LaTeX package url (\usepackage{url}
somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:
@misc{ wiki:xxx, author = "WikiPatents", title = "20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.) --- WikiPatents{,} ", year = "2024", url = "\url{http://wikipatents.org/index.php?title=20240085778.PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(samsung_electronics_co.,_ltd.)&oldid=39543}", note = "[Online; accessed 30-June-2024]" }