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Bibliographic details for 18508195. TARGET CONTROL IN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS USING ABERRATION OF REFLECTION IMAGE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)

Citation styles for 18508195. TARGET CONTROL IN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS USING ABERRATION OF REFLECTION IMAGE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)

APA style

18508195. TARGET CONTROL IN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS USING ABERRATION OF REFLECTION IMAGE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.). (2024, March 16). WikiPatents, . Retrieved 20:04, June 21, 2024 from http://wikipatents.org/index.php?title=18508195._TARGET_CONTROL_IN_EXTREME_ULTRAVIOLET_LITHOGRAPHY_SYSTEMS_USING_ABERRATION_OF_REFLECTION_IMAGE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37338.

MLA style

"18508195. TARGET CONTROL IN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS USING ABERRATION OF REFLECTION IMAGE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)." WikiPatents, . 16 Mar 2024, 23:53 UTC. 21 Jun 2024, 20:04 <http://wikipatents.org/index.php?title=18508195._TARGET_CONTROL_IN_EXTREME_ULTRAVIOLET_LITHOGRAPHY_SYSTEMS_USING_ABERRATION_OF_REFLECTION_IMAGE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37338>.

MHRA style

WikiPatents contributors, '18508195. TARGET CONTROL IN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS USING ABERRATION OF REFLECTION IMAGE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)', WikiPatents, , 16 March 2024, 23:53 UTC, <http://wikipatents.org/index.php?title=18508195._TARGET_CONTROL_IN_EXTREME_ULTRAVIOLET_LITHOGRAPHY_SYSTEMS_USING_ABERRATION_OF_REFLECTION_IMAGE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37338> [accessed 21 June 2024]

Chicago style

WikiPatents contributors, "18508195. TARGET CONTROL IN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS USING ABERRATION OF REFLECTION IMAGE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=18508195._TARGET_CONTROL_IN_EXTREME_ULTRAVIOLET_LITHOGRAPHY_SYSTEMS_USING_ABERRATION_OF_REFLECTION_IMAGE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37338 (accessed June 21, 2024).

CBE/CSE style

WikiPatents contributors. 18508195. TARGET CONTROL IN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS USING ABERRATION OF REFLECTION IMAGE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) [Internet]. WikiPatents, ; 2024 Mar 16, 23:53 UTC [cited 2024 Jun 21]. Available from: http://wikipatents.org/index.php?title=18508195._TARGET_CONTROL_IN_EXTREME_ULTRAVIOLET_LITHOGRAPHY_SYSTEMS_USING_ABERRATION_OF_REFLECTION_IMAGE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37338.

Bluebook style

18508195. TARGET CONTROL IN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS USING ABERRATION OF REFLECTION IMAGE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.), http://wikipatents.org/index.php?title=18508195._TARGET_CONTROL_IN_EXTREME_ULTRAVIOLET_LITHOGRAPHY_SYSTEMS_USING_ABERRATION_OF_REFLECTION_IMAGE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37338 (last visited June 21, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18508195. TARGET CONTROL IN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS USING ABERRATION OF REFLECTION IMAGE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18508195._TARGET_CONTROL_IN_EXTREME_ULTRAVIOLET_LITHOGRAPHY_SYSTEMS_USING_ABERRATION_OF_REFLECTION_IMAGE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37338",
   note = "[Online; accessed 21-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18508195. TARGET CONTROL IN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS USING ABERRATION OF REFLECTION IMAGE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18508195._TARGET_CONTROL_IN_EXTREME_ULTRAVIOLET_LITHOGRAPHY_SYSTEMS_USING_ABERRATION_OF_REFLECTION_IMAGE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37338}",
   note = "[Online; accessed 21-June-2024]"
 }


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