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Bibliographic details for 18517828. CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)

Citation styles for 18517828. CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)

APA style

18517828. CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.). (2024, March 16). WikiPatents, . Retrieved 22:42, June 25, 2024 from http://wikipatents.org/index.php?title=18517828._CLEANING_METHOD_FOR_PHOTO_MASKS_AND_APPARATUS_THEREFOR_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37337.

MLA style

"18517828. CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)." WikiPatents, . 16 Mar 2024, 23:53 UTC. 25 Jun 2024, 22:42 <http://wikipatents.org/index.php?title=18517828._CLEANING_METHOD_FOR_PHOTO_MASKS_AND_APPARATUS_THEREFOR_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37337>.

MHRA style

WikiPatents contributors, '18517828. CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)', WikiPatents, , 16 March 2024, 23:53 UTC, <http://wikipatents.org/index.php?title=18517828._CLEANING_METHOD_FOR_PHOTO_MASKS_AND_APPARATUS_THEREFOR_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37337> [accessed 25 June 2024]

Chicago style

WikiPatents contributors, "18517828. CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=18517828._CLEANING_METHOD_FOR_PHOTO_MASKS_AND_APPARATUS_THEREFOR_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37337 (accessed June 25, 2024).

CBE/CSE style

WikiPatents contributors. 18517828. CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) [Internet]. WikiPatents, ; 2024 Mar 16, 23:53 UTC [cited 2024 Jun 25]. Available from: http://wikipatents.org/index.php?title=18517828._CLEANING_METHOD_FOR_PHOTO_MASKS_AND_APPARATUS_THEREFOR_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37337.

Bluebook style

18517828. CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.), http://wikipatents.org/index.php?title=18517828._CLEANING_METHOD_FOR_PHOTO_MASKS_AND_APPARATUS_THEREFOR_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37337 (last visited June 25, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18517828. CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18517828._CLEANING_METHOD_FOR_PHOTO_MASKS_AND_APPARATUS_THEREFOR_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37337",
   note = "[Online; accessed 25-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18517828. CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18517828._CLEANING_METHOD_FOR_PHOTO_MASKS_AND_APPARATUS_THEREFOR_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37337}",
   note = "[Online; accessed 25-June-2024]"
 }


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