Cite This Page

Jump to navigation Jump to search

Bibliographic details for 18318042. PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

Citation styles for 18318042. PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

APA style

18318042. PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.). (2024, March 16). WikiPatents, . Retrieved 18:46, June 23, 2024 from http://wikipatents.org/index.php?title=18318042._PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=37190.

MLA style

"18318042. PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)." WikiPatents, . 16 Mar 2024, 23:40 UTC. 23 Jun 2024, 18:46 <http://wikipatents.org/index.php?title=18318042._PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=37190>.

MHRA style

WikiPatents contributors, '18318042. PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)', WikiPatents, , 16 March 2024, 23:40 UTC, <http://wikipatents.org/index.php?title=18318042._PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=37190> [accessed 23 June 2024]

Chicago style

WikiPatents contributors, "18318042. PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)," WikiPatents, , http://wikipatents.org/index.php?title=18318042._PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=37190 (accessed June 23, 2024).

CBE/CSE style

WikiPatents contributors. 18318042. PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) [Internet]. WikiPatents, ; 2024 Mar 16, 23:40 UTC [cited 2024 Jun 23]. Available from: http://wikipatents.org/index.php?title=18318042._PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=37190.

Bluebook style

18318042. PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.), http://wikipatents.org/index.php?title=18318042._PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=37190 (last visited June 23, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18318042. PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18318042._PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=37190",
   note = "[Online; accessed 23-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18318042. PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18318042._PHOTOMASK_INCLUDING_LINE_PATTERN_MONITORING_MARK_AND_METHOD_OF_MANUFACTURING_INTEGRATED_CIRCUIT_DEVICE_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=37190}",
   note = "[Online; accessed 23-June-2024]"
 }


Retrieved from "http://wikipatents.org/index.php?title=Special:CiteThisPage"