Cite This Page

Jump to navigation Jump to search

Bibliographic details for 18230880. GAS TREATMENT SYSTEM, SEMICONDUCTOR PROCESS SYSTEM INCLUDING THE SAME, AND GAS TREATMENT METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

Citation styles for 18230880. GAS TREATMENT SYSTEM, SEMICONDUCTOR PROCESS SYSTEM INCLUDING THE SAME, AND GAS TREATMENT METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

APA style

18230880. GAS TREATMENT SYSTEM, SEMICONDUCTOR PROCESS SYSTEM INCLUDING THE SAME, AND GAS TREATMENT METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.). (2024, February 9). WikiPatents, . Retrieved 13:04, June 26, 2024 from http://wikipatents.org/index.php?title=18230880._GAS_TREATMENT_SYSTEM,_SEMICONDUCTOR_PROCESS_SYSTEM_INCLUDING_THE_SAME,_AND_GAS_TREATMENT_METHOD_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=33085.

MLA style

"18230880. GAS TREATMENT SYSTEM, SEMICONDUCTOR PROCESS SYSTEM INCLUDING THE SAME, AND GAS TREATMENT METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)." WikiPatents, . 9 Feb 2024, 04:11 UTC. 26 Jun 2024, 13:04 <http://wikipatents.org/index.php?title=18230880._GAS_TREATMENT_SYSTEM,_SEMICONDUCTOR_PROCESS_SYSTEM_INCLUDING_THE_SAME,_AND_GAS_TREATMENT_METHOD_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=33085>.

MHRA style

WikiPatents contributors, '18230880. GAS TREATMENT SYSTEM, SEMICONDUCTOR PROCESS SYSTEM INCLUDING THE SAME, AND GAS TREATMENT METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)', WikiPatents, , 9 February 2024, 04:11 UTC, <http://wikipatents.org/index.php?title=18230880._GAS_TREATMENT_SYSTEM,_SEMICONDUCTOR_PROCESS_SYSTEM_INCLUDING_THE_SAME,_AND_GAS_TREATMENT_METHOD_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=33085> [accessed 26 June 2024]

Chicago style

WikiPatents contributors, "18230880. GAS TREATMENT SYSTEM, SEMICONDUCTOR PROCESS SYSTEM INCLUDING THE SAME, AND GAS TREATMENT METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)," WikiPatents, , http://wikipatents.org/index.php?title=18230880._GAS_TREATMENT_SYSTEM,_SEMICONDUCTOR_PROCESS_SYSTEM_INCLUDING_THE_SAME,_AND_GAS_TREATMENT_METHOD_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=33085 (accessed June 26, 2024).

CBE/CSE style

WikiPatents contributors. 18230880. GAS TREATMENT SYSTEM, SEMICONDUCTOR PROCESS SYSTEM INCLUDING THE SAME, AND GAS TREATMENT METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) [Internet]. WikiPatents, ; 2024 Feb 9, 04:11 UTC [cited 2024 Jun 26]. Available from: http://wikipatents.org/index.php?title=18230880._GAS_TREATMENT_SYSTEM,_SEMICONDUCTOR_PROCESS_SYSTEM_INCLUDING_THE_SAME,_AND_GAS_TREATMENT_METHOD_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=33085.

Bluebook style

18230880. GAS TREATMENT SYSTEM, SEMICONDUCTOR PROCESS SYSTEM INCLUDING THE SAME, AND GAS TREATMENT METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.), http://wikipatents.org/index.php?title=18230880._GAS_TREATMENT_SYSTEM,_SEMICONDUCTOR_PROCESS_SYSTEM_INCLUDING_THE_SAME,_AND_GAS_TREATMENT_METHOD_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=33085 (last visited June 26, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18230880. GAS TREATMENT SYSTEM, SEMICONDUCTOR PROCESS SYSTEM INCLUDING THE SAME, AND GAS TREATMENT METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18230880._GAS_TREATMENT_SYSTEM,_SEMICONDUCTOR_PROCESS_SYSTEM_INCLUDING_THE_SAME,_AND_GAS_TREATMENT_METHOD_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=33085",
   note = "[Online; accessed 26-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18230880. GAS TREATMENT SYSTEM, SEMICONDUCTOR PROCESS SYSTEM INCLUDING THE SAME, AND GAS TREATMENT METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18230880._GAS_TREATMENT_SYSTEM,_SEMICONDUCTOR_PROCESS_SYSTEM_INCLUDING_THE_SAME,_AND_GAS_TREATMENT_METHOD_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=33085}",
   note = "[Online; accessed 26-June-2024]"
 }


Retrieved from "http://wikipatents.org/index.php?title=Special:CiteThisPage"