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Bibliographic details for 18350611. LITHOGRAPHY MODEL SIMULATION METHOD, PHOTOMASK GENERATING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE FABRICATION METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

Citation styles for 18350611. LITHOGRAPHY MODEL SIMULATION METHOD, PHOTOMASK GENERATING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE FABRICATION METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

APA style

18350611. LITHOGRAPHY MODEL SIMULATION METHOD, PHOTOMASK GENERATING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE FABRICATION METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.). (2024, February 2). WikiPatents, . Retrieved 03:27, June 29, 2024 from http://wikipatents.org/index.php?title=18350611._LITHOGRAPHY_MODEL_SIMULATION_METHOD,_PHOTOMASK_GENERATING_METHOD_USING_THE_SAME,_AND_SEMICONDUCTOR_DEVICE_FABRICATION_METHOD_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=31156.

MLA style

"18350611. LITHOGRAPHY MODEL SIMULATION METHOD, PHOTOMASK GENERATING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE FABRICATION METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)." WikiPatents, . 2 Feb 2024, 04:31 UTC. 29 Jun 2024, 03:27 <http://wikipatents.org/index.php?title=18350611._LITHOGRAPHY_MODEL_SIMULATION_METHOD,_PHOTOMASK_GENERATING_METHOD_USING_THE_SAME,_AND_SEMICONDUCTOR_DEVICE_FABRICATION_METHOD_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=31156>.

MHRA style

WikiPatents contributors, '18350611. LITHOGRAPHY MODEL SIMULATION METHOD, PHOTOMASK GENERATING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE FABRICATION METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)', WikiPatents, , 2 February 2024, 04:31 UTC, <http://wikipatents.org/index.php?title=18350611._LITHOGRAPHY_MODEL_SIMULATION_METHOD,_PHOTOMASK_GENERATING_METHOD_USING_THE_SAME,_AND_SEMICONDUCTOR_DEVICE_FABRICATION_METHOD_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=31156> [accessed 29 June 2024]

Chicago style

WikiPatents contributors, "18350611. LITHOGRAPHY MODEL SIMULATION METHOD, PHOTOMASK GENERATING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE FABRICATION METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)," WikiPatents, , http://wikipatents.org/index.php?title=18350611._LITHOGRAPHY_MODEL_SIMULATION_METHOD,_PHOTOMASK_GENERATING_METHOD_USING_THE_SAME,_AND_SEMICONDUCTOR_DEVICE_FABRICATION_METHOD_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=31156 (accessed June 29, 2024).

CBE/CSE style

WikiPatents contributors. 18350611. LITHOGRAPHY MODEL SIMULATION METHOD, PHOTOMASK GENERATING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE FABRICATION METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) [Internet]. WikiPatents, ; 2024 Feb 2, 04:31 UTC [cited 2024 Jun 29]. Available from: http://wikipatents.org/index.php?title=18350611._LITHOGRAPHY_MODEL_SIMULATION_METHOD,_PHOTOMASK_GENERATING_METHOD_USING_THE_SAME,_AND_SEMICONDUCTOR_DEVICE_FABRICATION_METHOD_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=31156.

Bluebook style

18350611. LITHOGRAPHY MODEL SIMULATION METHOD, PHOTOMASK GENERATING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE FABRICATION METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.), http://wikipatents.org/index.php?title=18350611._LITHOGRAPHY_MODEL_SIMULATION_METHOD,_PHOTOMASK_GENERATING_METHOD_USING_THE_SAME,_AND_SEMICONDUCTOR_DEVICE_FABRICATION_METHOD_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=31156 (last visited June 29, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18350611. LITHOGRAPHY MODEL SIMULATION METHOD, PHOTOMASK GENERATING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE FABRICATION METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18350611._LITHOGRAPHY_MODEL_SIMULATION_METHOD,_PHOTOMASK_GENERATING_METHOD_USING_THE_SAME,_AND_SEMICONDUCTOR_DEVICE_FABRICATION_METHOD_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=31156",
   note = "[Online; accessed 29-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18350611. LITHOGRAPHY MODEL SIMULATION METHOD, PHOTOMASK GENERATING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE FABRICATION METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18350611._LITHOGRAPHY_MODEL_SIMULATION_METHOD,_PHOTOMASK_GENERATING_METHOD_USING_THE_SAME,_AND_SEMICONDUCTOR_DEVICE_FABRICATION_METHOD_USING_THE_SAME_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=31156}",
   note = "[Online; accessed 29-June-2024]"
 }


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