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Bibliographic details for 18158086. Highly Physical Ion Resistive Spacer To Define Chemical Damage Free Sub 60nm Mram Devices simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)

Citation styles for 18158086. Highly Physical Ion Resistive Spacer To Define Chemical Damage Free Sub 60nm Mram Devices simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)

APA style

18158086. Highly Physical Ion Resistive Spacer To Define Chemical Damage Free Sub 60nm Mram Devices simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.). (2024, January 4). WikiPatents, . Retrieved 03:33, June 23, 2024 from http://wikipatents.org/index.php?title=18158086._Highly_Physical_Ion_Resistive_Spacer_To_Define_Chemical_Damage_Free_Sub_60nm_Mram_Devices_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=25220.

MLA style

"18158086. Highly Physical Ion Resistive Spacer To Define Chemical Damage Free Sub 60nm Mram Devices simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)." WikiPatents, . 4 Jan 2024, 05:33 UTC. 23 Jun 2024, 03:33 <http://wikipatents.org/index.php?title=18158086._Highly_Physical_Ion_Resistive_Spacer_To_Define_Chemical_Damage_Free_Sub_60nm_Mram_Devices_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=25220>.

MHRA style

WikiPatents contributors, '18158086. Highly Physical Ion Resistive Spacer To Define Chemical Damage Free Sub 60nm Mram Devices simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)', WikiPatents, , 4 January 2024, 05:33 UTC, <http://wikipatents.org/index.php?title=18158086._Highly_Physical_Ion_Resistive_Spacer_To_Define_Chemical_Damage_Free_Sub_60nm_Mram_Devices_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=25220> [accessed 23 June 2024]

Chicago style

WikiPatents contributors, "18158086. Highly Physical Ion Resistive Spacer To Define Chemical Damage Free Sub 60nm Mram Devices simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)," WikiPatents, , http://wikipatents.org/index.php?title=18158086._Highly_Physical_Ion_Resistive_Spacer_To_Define_Chemical_Damage_Free_Sub_60nm_Mram_Devices_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=25220 (accessed June 23, 2024).

CBE/CSE style

WikiPatents contributors. 18158086. Highly Physical Ion Resistive Spacer To Define Chemical Damage Free Sub 60nm Mram Devices simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) [Internet]. WikiPatents, ; 2024 Jan 4, 05:33 UTC [cited 2024 Jun 23]. Available from: http://wikipatents.org/index.php?title=18158086._Highly_Physical_Ion_Resistive_Spacer_To_Define_Chemical_Damage_Free_Sub_60nm_Mram_Devices_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=25220.

Bluebook style

18158086. Highly Physical Ion Resistive Spacer To Define Chemical Damage Free Sub 60nm Mram Devices simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.), http://wikipatents.org/index.php?title=18158086._Highly_Physical_Ion_Resistive_Spacer_To_Define_Chemical_Damage_Free_Sub_60nm_Mram_Devices_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=25220 (last visited June 23, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18158086. Highly Physical Ion Resistive Spacer To Define Chemical Damage Free Sub 60nm Mram Devices simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18158086._Highly_Physical_Ion_Resistive_Spacer_To_Define_Chemical_Damage_Free_Sub_60nm_Mram_Devices_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=25220",
   note = "[Online; accessed 23-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18158086. Highly Physical Ion Resistive Spacer To Define Chemical Damage Free Sub 60nm Mram Devices simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18158086._Highly_Physical_Ion_Resistive_Spacer_To_Define_Chemical_Damage_Free_Sub_60nm_Mram_Devices_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=25220}",
   note = "[Online; accessed 23-June-2024]"
 }


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