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Bibliographic details for 18158086. Highly Physical Ion Resistive Spacer To Define Chemical Damage Free Sub 60nm Mram Devices simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- Page name: 18158086. Highly Physical Ion Resistive Spacer To Define Chemical Damage Free Sub 60nm Mram Devices simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- Author: WikiPatents contributors
- Publisher: WikiPatents, .
- Date of last revision: 4 January 2024 05:33 UTC
- Date retrieved: 28 June 2024 02:53 UTC
- Permanent URL: http://wikipatents.org/index.php?title=18158086._Highly_Physical_Ion_Resistive_Spacer_To_Define_Chemical_Damage_Free_Sub_60nm_Mram_Devices_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=25220
- Page Version ID: 25220
Citation styles for 18158086. Highly Physical Ion Resistive Spacer To Define Chemical Damage Free Sub 60nm Mram Devices simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
APA style
18158086. Highly Physical Ion Resistive Spacer To Define Chemical Damage Free Sub 60nm Mram Devices simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.). (2024, January 4). WikiPatents, . Retrieved 02:53, June 28, 2024 from http://wikipatents.org/index.php?title=18158086._Highly_Physical_Ion_Resistive_Spacer_To_Define_Chemical_Damage_Free_Sub_60nm_Mram_Devices_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=25220.
MLA style
"18158086. Highly Physical Ion Resistive Spacer To Define Chemical Damage Free Sub 60nm Mram Devices simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)." WikiPatents, . 4 Jan 2024, 05:33 UTC. 28 Jun 2024, 02:53 <http://wikipatents.org/index.php?title=18158086._Highly_Physical_Ion_Resistive_Spacer_To_Define_Chemical_Damage_Free_Sub_60nm_Mram_Devices_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=25220>.
MHRA style
WikiPatents contributors, '18158086. Highly Physical Ion Resistive Spacer To Define Chemical Damage Free Sub 60nm Mram Devices simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)', WikiPatents, , 4 January 2024, 05:33 UTC, <http://wikipatents.org/index.php?title=18158086._Highly_Physical_Ion_Resistive_Spacer_To_Define_Chemical_Damage_Free_Sub_60nm_Mram_Devices_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=25220> [accessed 28 June 2024]
Chicago style
WikiPatents contributors, "18158086. Highly Physical Ion Resistive Spacer To Define Chemical Damage Free Sub 60nm Mram Devices simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)," WikiPatents, , http://wikipatents.org/index.php?title=18158086._Highly_Physical_Ion_Resistive_Spacer_To_Define_Chemical_Damage_Free_Sub_60nm_Mram_Devices_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=25220 (accessed June 28, 2024).
CBE/CSE style
WikiPatents contributors. 18158086. Highly Physical Ion Resistive Spacer To Define Chemical Damage Free Sub 60nm Mram Devices simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) [Internet]. WikiPatents, ; 2024 Jan 4, 05:33 UTC [cited 2024 Jun 28]. Available from: http://wikipatents.org/index.php?title=18158086._Highly_Physical_Ion_Resistive_Spacer_To_Define_Chemical_Damage_Free_Sub_60nm_Mram_Devices_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=25220.
Bluebook style
18158086. Highly Physical Ion Resistive Spacer To Define Chemical Damage Free Sub 60nm Mram Devices simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.), http://wikipatents.org/index.php?title=18158086._Highly_Physical_Ion_Resistive_Spacer_To_Define_Chemical_Damage_Free_Sub_60nm_Mram_Devices_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=25220 (last visited June 28, 2024).
BibTeX entry
@misc{ wiki:xxx, author = "WikiPatents", title = "18158086. Highly Physical Ion Resistive Spacer To Define Chemical Damage Free Sub 60nm Mram Devices simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) --- WikiPatents{,} ", year = "2024", url = "http://wikipatents.org/index.php?title=18158086._Highly_Physical_Ion_Resistive_Spacer_To_Define_Chemical_Damage_Free_Sub_60nm_Mram_Devices_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=25220", note = "[Online; accessed 28-June-2024]" }
When using the LaTeX package url (\usepackage{url}
somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:
@misc{ wiki:xxx, author = "WikiPatents", title = "18158086. Highly Physical Ion Resistive Spacer To Define Chemical Damage Free Sub 60nm Mram Devices simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) --- WikiPatents{,} ", year = "2024", url = "\url{http://wikipatents.org/index.php?title=18158086._Highly_Physical_Ion_Resistive_Spacer_To_Define_Chemical_Damage_Free_Sub_60nm_Mram_Devices_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=25220}", note = "[Online; accessed 28-June-2024]" }