Cite This Page
Bibliographic details for Samsung electronics co., ltd. (20240347617). ELEMENTAL DOPING OF HIGH-K DIELECTRIC OXIDE TO CREATE P-TYPE CONDUCTIVITY IN THIN LAYER CHANNELS VIA SURFACE CHARGE TRANSFER simplified abstract
- Page name: Samsung electronics co., ltd. (20240347617). ELEMENTAL DOPING OF HIGH-K DIELECTRIC OXIDE TO CREATE P-TYPE CONDUCTIVITY IN THIN LAYER CHANNELS VIA SURFACE CHARGE TRANSFER simplified abstract
- Author: WikiPatents contributors
- Publisher: WikiPatents, .
- Date of last revision: 18 October 2024 00:43 UTC
- Date retrieved: 22 October 2024 10:28 UTC
- Permanent URL: http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240347617)._ELEMENTAL_DOPING_OF_HIGH-K_DIELECTRIC_OXIDE_TO_CREATE_P-TYPE_CONDUCTIVITY_IN_THIN_LAYER_CHANNELS_VIA_SURFACE_CHARGE_TRANSFER_simplified_abstract&oldid=248794
- Page Version ID: 248794
Citation styles for Samsung electronics co., ltd. (20240347617). ELEMENTAL DOPING OF HIGH-K DIELECTRIC OXIDE TO CREATE P-TYPE CONDUCTIVITY IN THIN LAYER CHANNELS VIA SURFACE CHARGE TRANSFER simplified abstract
APA style
Samsung electronics co., ltd. (20240347617). ELEMENTAL DOPING OF HIGH-K DIELECTRIC OXIDE TO CREATE P-TYPE CONDUCTIVITY IN THIN LAYER CHANNELS VIA SURFACE CHARGE TRANSFER simplified abstract. (2024, October 18). WikiPatents, . Retrieved 10:28, October 22, 2024 from http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240347617)._ELEMENTAL_DOPING_OF_HIGH-K_DIELECTRIC_OXIDE_TO_CREATE_P-TYPE_CONDUCTIVITY_IN_THIN_LAYER_CHANNELS_VIA_SURFACE_CHARGE_TRANSFER_simplified_abstract&oldid=248794.
MLA style
"Samsung electronics co., ltd. (20240347617). ELEMENTAL DOPING OF HIGH-K DIELECTRIC OXIDE TO CREATE P-TYPE CONDUCTIVITY IN THIN LAYER CHANNELS VIA SURFACE CHARGE TRANSFER simplified abstract." WikiPatents, . 18 Oct 2024, 00:43 UTC. 22 Oct 2024, 10:28 <http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240347617)._ELEMENTAL_DOPING_OF_HIGH-K_DIELECTRIC_OXIDE_TO_CREATE_P-TYPE_CONDUCTIVITY_IN_THIN_LAYER_CHANNELS_VIA_SURFACE_CHARGE_TRANSFER_simplified_abstract&oldid=248794>.
MHRA style
WikiPatents contributors, 'Samsung electronics co., ltd. (20240347617). ELEMENTAL DOPING OF HIGH-K DIELECTRIC OXIDE TO CREATE P-TYPE CONDUCTIVITY IN THIN LAYER CHANNELS VIA SURFACE CHARGE TRANSFER simplified abstract', WikiPatents, , 18 October 2024, 00:43 UTC, <http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240347617)._ELEMENTAL_DOPING_OF_HIGH-K_DIELECTRIC_OXIDE_TO_CREATE_P-TYPE_CONDUCTIVITY_IN_THIN_LAYER_CHANNELS_VIA_SURFACE_CHARGE_TRANSFER_simplified_abstract&oldid=248794> [accessed 22 October 2024]
Chicago style
WikiPatents contributors, "Samsung electronics co., ltd. (20240347617). ELEMENTAL DOPING OF HIGH-K DIELECTRIC OXIDE TO CREATE P-TYPE CONDUCTIVITY IN THIN LAYER CHANNELS VIA SURFACE CHARGE TRANSFER simplified abstract," WikiPatents, , http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240347617)._ELEMENTAL_DOPING_OF_HIGH-K_DIELECTRIC_OXIDE_TO_CREATE_P-TYPE_CONDUCTIVITY_IN_THIN_LAYER_CHANNELS_VIA_SURFACE_CHARGE_TRANSFER_simplified_abstract&oldid=248794 (accessed October 22, 2024).
CBE/CSE style
WikiPatents contributors. Samsung electronics co., ltd. (20240347617). ELEMENTAL DOPING OF HIGH-K DIELECTRIC OXIDE TO CREATE P-TYPE CONDUCTIVITY IN THIN LAYER CHANNELS VIA SURFACE CHARGE TRANSFER simplified abstract [Internet]. WikiPatents, ; 2024 Oct 18, 00:43 UTC [cited 2024 Oct 22]. Available from: http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240347617)._ELEMENTAL_DOPING_OF_HIGH-K_DIELECTRIC_OXIDE_TO_CREATE_P-TYPE_CONDUCTIVITY_IN_THIN_LAYER_CHANNELS_VIA_SURFACE_CHARGE_TRANSFER_simplified_abstract&oldid=248794.
Bluebook style
Samsung electronics co., ltd. (20240347617). ELEMENTAL DOPING OF HIGH-K DIELECTRIC OXIDE TO CREATE P-TYPE CONDUCTIVITY IN THIN LAYER CHANNELS VIA SURFACE CHARGE TRANSFER simplified abstract, http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240347617)._ELEMENTAL_DOPING_OF_HIGH-K_DIELECTRIC_OXIDE_TO_CREATE_P-TYPE_CONDUCTIVITY_IN_THIN_LAYER_CHANNELS_VIA_SURFACE_CHARGE_TRANSFER_simplified_abstract&oldid=248794 (last visited October 22, 2024).
BibTeX entry
@misc{ wiki:xxx, author = "WikiPatents", title = "Samsung electronics co., ltd. (20240347617). ELEMENTAL DOPING OF HIGH-K DIELECTRIC OXIDE TO CREATE P-TYPE CONDUCTIVITY IN THIN LAYER CHANNELS VIA SURFACE CHARGE TRANSFER simplified abstract --- WikiPatents{,} ", year = "2024", url = "http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240347617)._ELEMENTAL_DOPING_OF_HIGH-K_DIELECTRIC_OXIDE_TO_CREATE_P-TYPE_CONDUCTIVITY_IN_THIN_LAYER_CHANNELS_VIA_SURFACE_CHARGE_TRANSFER_simplified_abstract&oldid=248794", note = "[Online; accessed 22-October-2024]" }
When using the LaTeX package url (\usepackage{url}
somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:
@misc{ wiki:xxx, author = "WikiPatents", title = "Samsung electronics co., ltd. (20240347617). ELEMENTAL DOPING OF HIGH-K DIELECTRIC OXIDE TO CREATE P-TYPE CONDUCTIVITY IN THIN LAYER CHANNELS VIA SURFACE CHARGE TRANSFER simplified abstract --- WikiPatents{,} ", year = "2024", url = "\url{http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240347617)._ELEMENTAL_DOPING_OF_HIGH-K_DIELECTRIC_OXIDE_TO_CREATE_P-TYPE_CONDUCTIVITY_IN_THIN_LAYER_CHANNELS_VIA_SURFACE_CHARGE_TRANSFER_simplified_abstract&oldid=248794}", note = "[Online; accessed 22-October-2024]" }