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Bibliographic details for Taiwan semiconductor manufacturing company, ltd. (20240339545). GATE-ALL-AROUND STRUCTURE WITH SELF SUBSTRATE ISOLATION AND METHODS OF FORMING THE SAME simplified abstract
- Page name: Taiwan semiconductor manufacturing company, ltd. (20240339545). GATE-ALL-AROUND STRUCTURE WITH SELF SUBSTRATE ISOLATION AND METHODS OF FORMING THE SAME simplified abstract
- Author: WikiPatents contributors
- Publisher: WikiPatents, .
- Date of last revision: 14 October 2024 00:02 UTC
- Date retrieved: 19 October 2024 03:49 UTC
- Permanent URL: http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240339545)._GATE-ALL-AROUND_STRUCTURE_WITH_SELF_SUBSTRATE_ISOLATION_AND_METHODS_OF_FORMING_THE_SAME_simplified_abstract&oldid=248143
- Page Version ID: 248143
Citation styles for Taiwan semiconductor manufacturing company, ltd. (20240339545). GATE-ALL-AROUND STRUCTURE WITH SELF SUBSTRATE ISOLATION AND METHODS OF FORMING THE SAME simplified abstract
APA style
Taiwan semiconductor manufacturing company, ltd. (20240339545). GATE-ALL-AROUND STRUCTURE WITH SELF SUBSTRATE ISOLATION AND METHODS OF FORMING THE SAME simplified abstract. (2024, October 14). WikiPatents, . Retrieved 03:49, October 19, 2024 from http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240339545)._GATE-ALL-AROUND_STRUCTURE_WITH_SELF_SUBSTRATE_ISOLATION_AND_METHODS_OF_FORMING_THE_SAME_simplified_abstract&oldid=248143.
MLA style
"Taiwan semiconductor manufacturing company, ltd. (20240339545). GATE-ALL-AROUND STRUCTURE WITH SELF SUBSTRATE ISOLATION AND METHODS OF FORMING THE SAME simplified abstract." WikiPatents, . 14 Oct 2024, 00:02 UTC. 19 Oct 2024, 03:49 <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240339545)._GATE-ALL-AROUND_STRUCTURE_WITH_SELF_SUBSTRATE_ISOLATION_AND_METHODS_OF_FORMING_THE_SAME_simplified_abstract&oldid=248143>.
MHRA style
WikiPatents contributors, 'Taiwan semiconductor manufacturing company, ltd. (20240339545). GATE-ALL-AROUND STRUCTURE WITH SELF SUBSTRATE ISOLATION AND METHODS OF FORMING THE SAME simplified abstract', WikiPatents, , 14 October 2024, 00:02 UTC, <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240339545)._GATE-ALL-AROUND_STRUCTURE_WITH_SELF_SUBSTRATE_ISOLATION_AND_METHODS_OF_FORMING_THE_SAME_simplified_abstract&oldid=248143> [accessed 19 October 2024]
Chicago style
WikiPatents contributors, "Taiwan semiconductor manufacturing company, ltd. (20240339545). GATE-ALL-AROUND STRUCTURE WITH SELF SUBSTRATE ISOLATION AND METHODS OF FORMING THE SAME simplified abstract," WikiPatents, , http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240339545)._GATE-ALL-AROUND_STRUCTURE_WITH_SELF_SUBSTRATE_ISOLATION_AND_METHODS_OF_FORMING_THE_SAME_simplified_abstract&oldid=248143 (accessed October 19, 2024).
CBE/CSE style
WikiPatents contributors. Taiwan semiconductor manufacturing company, ltd. (20240339545). GATE-ALL-AROUND STRUCTURE WITH SELF SUBSTRATE ISOLATION AND METHODS OF FORMING THE SAME simplified abstract [Internet]. WikiPatents, ; 2024 Oct 14, 00:02 UTC [cited 2024 Oct 19]. Available from: http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240339545)._GATE-ALL-AROUND_STRUCTURE_WITH_SELF_SUBSTRATE_ISOLATION_AND_METHODS_OF_FORMING_THE_SAME_simplified_abstract&oldid=248143.
Bluebook style
Taiwan semiconductor manufacturing company, ltd. (20240339545). GATE-ALL-AROUND STRUCTURE WITH SELF SUBSTRATE ISOLATION AND METHODS OF FORMING THE SAME simplified abstract, http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240339545)._GATE-ALL-AROUND_STRUCTURE_WITH_SELF_SUBSTRATE_ISOLATION_AND_METHODS_OF_FORMING_THE_SAME_simplified_abstract&oldid=248143 (last visited October 19, 2024).
BibTeX entry
@misc{ wiki:xxx, author = "WikiPatents", title = "Taiwan semiconductor manufacturing company, ltd. (20240339545). GATE-ALL-AROUND STRUCTURE WITH SELF SUBSTRATE ISOLATION AND METHODS OF FORMING THE SAME simplified abstract --- WikiPatents{,} ", year = "2024", url = "http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240339545)._GATE-ALL-AROUND_STRUCTURE_WITH_SELF_SUBSTRATE_ISOLATION_AND_METHODS_OF_FORMING_THE_SAME_simplified_abstract&oldid=248143", note = "[Online; accessed 19-October-2024]" }
When using the LaTeX package url (\usepackage{url}
somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:
@misc{ wiki:xxx, author = "WikiPatents", title = "Taiwan semiconductor manufacturing company, ltd. (20240339545). GATE-ALL-AROUND STRUCTURE WITH SELF SUBSTRATE ISOLATION AND METHODS OF FORMING THE SAME simplified abstract --- WikiPatents{,} ", year = "2024", url = "\url{http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240339545)._GATE-ALL-AROUND_STRUCTURE_WITH_SELF_SUBSTRATE_ISOLATION_AND_METHODS_OF_FORMING_THE_SAME_simplified_abstract&oldid=248143}", note = "[Online; accessed 19-October-2024]" }