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Bibliographic details for Taiwan semiconductor manufacturing co., ltd. (20240327677). CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLISHING METAL LAYER simplified abstract

Citation styles for Taiwan semiconductor manufacturing co., ltd. (20240327677). CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLISHING METAL LAYER simplified abstract

APA style

Taiwan semiconductor manufacturing co., ltd. (20240327677). CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLISHING METAL LAYER simplified abstract. (2024, October 8). WikiPatents, . Retrieved 02:19, October 19, 2024 from http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240327677)._CHEMICAL_MECHANICAL_POLISHING_SLURRY_COMPOSITION_AND_METHOD_OF_POLISHING_METAL_LAYER_simplified_abstract&oldid=247430.

MLA style

"Taiwan semiconductor manufacturing co., ltd. (20240327677). CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLISHING METAL LAYER simplified abstract." WikiPatents, . 8 Oct 2024, 12:53 UTC. 19 Oct 2024, 02:19 <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240327677)._CHEMICAL_MECHANICAL_POLISHING_SLURRY_COMPOSITION_AND_METHOD_OF_POLISHING_METAL_LAYER_simplified_abstract&oldid=247430>.

MHRA style

WikiPatents contributors, 'Taiwan semiconductor manufacturing co., ltd. (20240327677). CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLISHING METAL LAYER simplified abstract', WikiPatents, , 8 October 2024, 12:53 UTC, <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240327677)._CHEMICAL_MECHANICAL_POLISHING_SLURRY_COMPOSITION_AND_METHOD_OF_POLISHING_METAL_LAYER_simplified_abstract&oldid=247430> [accessed 19 October 2024]

Chicago style

WikiPatents contributors, "Taiwan semiconductor manufacturing co., ltd. (20240327677). CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLISHING METAL LAYER simplified abstract," WikiPatents, , http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240327677)._CHEMICAL_MECHANICAL_POLISHING_SLURRY_COMPOSITION_AND_METHOD_OF_POLISHING_METAL_LAYER_simplified_abstract&oldid=247430 (accessed October 19, 2024).

CBE/CSE style

WikiPatents contributors. Taiwan semiconductor manufacturing co., ltd. (20240327677). CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLISHING METAL LAYER simplified abstract [Internet]. WikiPatents, ; 2024 Oct 8, 12:53 UTC [cited 2024 Oct 19]. Available from: http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240327677)._CHEMICAL_MECHANICAL_POLISHING_SLURRY_COMPOSITION_AND_METHOD_OF_POLISHING_METAL_LAYER_simplified_abstract&oldid=247430.

Bluebook style

Taiwan semiconductor manufacturing co., ltd. (20240327677). CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLISHING METAL LAYER simplified abstract, http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240327677)._CHEMICAL_MECHANICAL_POLISHING_SLURRY_COMPOSITION_AND_METHOD_OF_POLISHING_METAL_LAYER_simplified_abstract&oldid=247430 (last visited October 19, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "Taiwan semiconductor manufacturing co., ltd. (20240327677). CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLISHING METAL LAYER simplified abstract --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240327677)._CHEMICAL_MECHANICAL_POLISHING_SLURRY_COMPOSITION_AND_METHOD_OF_POLISHING_METAL_LAYER_simplified_abstract&oldid=247430",
   note = "[Online; accessed 19-October-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "Taiwan semiconductor manufacturing co., ltd. (20240327677). CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLISHING METAL LAYER simplified abstract --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_co.,_ltd._(20240327677)._CHEMICAL_MECHANICAL_POLISHING_SLURRY_COMPOSITION_AND_METHOD_OF_POLISHING_METAL_LAYER_simplified_abstract&oldid=247430}",
   note = "[Online; accessed 19-October-2024]"
 }


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