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Bibliographic details for Samsung electronics co., ltd. (20240320412). PROCESS PROXIMITY CORRECTION METHOD BASED ON DEEP LEARNING, AND SEMICONDUCTOR MANUFACTURING METHOD COMPRISING THE PROCESS PROXIMITY CORRECTION METHOD simplified abstract

Citation styles for Samsung electronics co., ltd. (20240320412). PROCESS PROXIMITY CORRECTION METHOD BASED ON DEEP LEARNING, AND SEMICONDUCTOR MANUFACTURING METHOD COMPRISING THE PROCESS PROXIMITY CORRECTION METHOD simplified abstract

APA style

Samsung electronics co., ltd. (20240320412). PROCESS PROXIMITY CORRECTION METHOD BASED ON DEEP LEARNING, AND SEMICONDUCTOR MANUFACTURING METHOD COMPRISING THE PROCESS PROXIMITY CORRECTION METHOD simplified abstract. (2024, September 27). WikiPatents, . Retrieved 07:38, October 19, 2024 from http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240320412)._PROCESS_PROXIMITY_CORRECTION_METHOD_BASED_ON_DEEP_LEARNING,_AND_SEMICONDUCTOR_MANUFACTURING_METHOD_COMPRISING_THE_PROCESS_PROXIMITY_CORRECTION_METHOD_simplified_abstract&oldid=237063.

MLA style

"Samsung electronics co., ltd. (20240320412). PROCESS PROXIMITY CORRECTION METHOD BASED ON DEEP LEARNING, AND SEMICONDUCTOR MANUFACTURING METHOD COMPRISING THE PROCESS PROXIMITY CORRECTION METHOD simplified abstract." WikiPatents, . 27 Sep 2024, 05:15 UTC. 19 Oct 2024, 07:38 <http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240320412)._PROCESS_PROXIMITY_CORRECTION_METHOD_BASED_ON_DEEP_LEARNING,_AND_SEMICONDUCTOR_MANUFACTURING_METHOD_COMPRISING_THE_PROCESS_PROXIMITY_CORRECTION_METHOD_simplified_abstract&oldid=237063>.

MHRA style

WikiPatents contributors, 'Samsung electronics co., ltd. (20240320412). PROCESS PROXIMITY CORRECTION METHOD BASED ON DEEP LEARNING, AND SEMICONDUCTOR MANUFACTURING METHOD COMPRISING THE PROCESS PROXIMITY CORRECTION METHOD simplified abstract', WikiPatents, , 27 September 2024, 05:15 UTC, <http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240320412)._PROCESS_PROXIMITY_CORRECTION_METHOD_BASED_ON_DEEP_LEARNING,_AND_SEMICONDUCTOR_MANUFACTURING_METHOD_COMPRISING_THE_PROCESS_PROXIMITY_CORRECTION_METHOD_simplified_abstract&oldid=237063> [accessed 19 October 2024]

Chicago style

WikiPatents contributors, "Samsung electronics co., ltd. (20240320412). PROCESS PROXIMITY CORRECTION METHOD BASED ON DEEP LEARNING, AND SEMICONDUCTOR MANUFACTURING METHOD COMPRISING THE PROCESS PROXIMITY CORRECTION METHOD simplified abstract," WikiPatents, , http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240320412)._PROCESS_PROXIMITY_CORRECTION_METHOD_BASED_ON_DEEP_LEARNING,_AND_SEMICONDUCTOR_MANUFACTURING_METHOD_COMPRISING_THE_PROCESS_PROXIMITY_CORRECTION_METHOD_simplified_abstract&oldid=237063 (accessed October 19, 2024).

CBE/CSE style

WikiPatents contributors. Samsung electronics co., ltd. (20240320412). PROCESS PROXIMITY CORRECTION METHOD BASED ON DEEP LEARNING, AND SEMICONDUCTOR MANUFACTURING METHOD COMPRISING THE PROCESS PROXIMITY CORRECTION METHOD simplified abstract [Internet]. WikiPatents, ; 2024 Sep 27, 05:15 UTC [cited 2024 Oct 19]. Available from: http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240320412)._PROCESS_PROXIMITY_CORRECTION_METHOD_BASED_ON_DEEP_LEARNING,_AND_SEMICONDUCTOR_MANUFACTURING_METHOD_COMPRISING_THE_PROCESS_PROXIMITY_CORRECTION_METHOD_simplified_abstract&oldid=237063.

Bluebook style

Samsung electronics co., ltd. (20240320412). PROCESS PROXIMITY CORRECTION METHOD BASED ON DEEP LEARNING, AND SEMICONDUCTOR MANUFACTURING METHOD COMPRISING THE PROCESS PROXIMITY CORRECTION METHOD simplified abstract, http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240320412)._PROCESS_PROXIMITY_CORRECTION_METHOD_BASED_ON_DEEP_LEARNING,_AND_SEMICONDUCTOR_MANUFACTURING_METHOD_COMPRISING_THE_PROCESS_PROXIMITY_CORRECTION_METHOD_simplified_abstract&oldid=237063 (last visited October 19, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "Samsung electronics co., ltd. (20240320412). PROCESS PROXIMITY CORRECTION METHOD BASED ON DEEP LEARNING, AND SEMICONDUCTOR MANUFACTURING METHOD COMPRISING THE PROCESS PROXIMITY CORRECTION METHOD simplified abstract --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240320412)._PROCESS_PROXIMITY_CORRECTION_METHOD_BASED_ON_DEEP_LEARNING,_AND_SEMICONDUCTOR_MANUFACTURING_METHOD_COMPRISING_THE_PROCESS_PROXIMITY_CORRECTION_METHOD_simplified_abstract&oldid=237063",
   note = "[Online; accessed 19-October-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "Samsung electronics co., ltd. (20240320412). PROCESS PROXIMITY CORRECTION METHOD BASED ON DEEP LEARNING, AND SEMICONDUCTOR MANUFACTURING METHOD COMPRISING THE PROCESS PROXIMITY CORRECTION METHOD simplified abstract --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=Samsung_electronics_co.,_ltd._(20240320412)._PROCESS_PROXIMITY_CORRECTION_METHOD_BASED_ON_DEEP_LEARNING,_AND_SEMICONDUCTOR_MANUFACTURING_METHOD_COMPRISING_THE_PROCESS_PROXIMITY_CORRECTION_METHOD_simplified_abstract&oldid=237063}",
   note = "[Online; accessed 19-October-2024]"
 }


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