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Bibliographic details for 17690150. METHODS FOR CLEANING LITHOGRAPHY MASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- Page name: 17690150. METHODS FOR CLEANING LITHOGRAPHY MASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- Author: WikiPatents contributors
- Publisher: WikiPatents, .
- Date of last revision: 4 January 2024 01:58 UTC
- Date retrieved: 26 September 2024 04:59 UTC
- Permanent URL: http://wikipatents.org/index.php?title=17690150._METHODS_FOR_CLEANING_LITHOGRAPHY_MASK_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=23599
- Page Version ID: 23599
Citation styles for 17690150. METHODS FOR CLEANING LITHOGRAPHY MASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
APA style
17690150. METHODS FOR CLEANING LITHOGRAPHY MASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.). (2024, January 4). WikiPatents, . Retrieved 04:59, September 26, 2024 from http://wikipatents.org/index.php?title=17690150._METHODS_FOR_CLEANING_LITHOGRAPHY_MASK_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=23599.
MLA style
"17690150. METHODS FOR CLEANING LITHOGRAPHY MASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)." WikiPatents, . 4 Jan 2024, 01:58 UTC. 26 Sep 2024, 04:59 <http://wikipatents.org/index.php?title=17690150._METHODS_FOR_CLEANING_LITHOGRAPHY_MASK_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=23599>.
MHRA style
WikiPatents contributors, '17690150. METHODS FOR CLEANING LITHOGRAPHY MASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)', WikiPatents, , 4 January 2024, 01:58 UTC, <http://wikipatents.org/index.php?title=17690150._METHODS_FOR_CLEANING_LITHOGRAPHY_MASK_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=23599> [accessed 26 September 2024]
Chicago style
WikiPatents contributors, "17690150. METHODS FOR CLEANING LITHOGRAPHY MASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=17690150._METHODS_FOR_CLEANING_LITHOGRAPHY_MASK_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=23599 (accessed September 26, 2024).
CBE/CSE style
WikiPatents contributors. 17690150. METHODS FOR CLEANING LITHOGRAPHY MASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) [Internet]. WikiPatents, ; 2024 Jan 4, 01:58 UTC [cited 2024 Sep 26]. Available from: http://wikipatents.org/index.php?title=17690150._METHODS_FOR_CLEANING_LITHOGRAPHY_MASK_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=23599.
Bluebook style
17690150. METHODS FOR CLEANING LITHOGRAPHY MASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.), http://wikipatents.org/index.php?title=17690150._METHODS_FOR_CLEANING_LITHOGRAPHY_MASK_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=23599 (last visited September 26, 2024).
BibTeX entry
@misc{ wiki:xxx,
author = "WikiPatents",
title = "17690150. METHODS FOR CLEANING LITHOGRAPHY MASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) --- WikiPatents{,} ",
year = "2024",
url = "http://wikipatents.org/index.php?title=17690150._METHODS_FOR_CLEANING_LITHOGRAPHY_MASK_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=23599",
note = "[Online; accessed 26-September-2024]"
}
When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:
@misc{ wiki:xxx,
author = "WikiPatents",
title = "17690150. METHODS FOR CLEANING LITHOGRAPHY MASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) --- WikiPatents{,} ",
year = "2024",
url = "\url{http://wikipatents.org/index.php?title=17690150._METHODS_FOR_CLEANING_LITHOGRAPHY_MASK_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=23599}",
note = "[Online; accessed 26-September-2024]"
}
