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Citation styles for 18112120. METHODS FOR RETAINING A PROCESSING LIQUID ON A SURFACE OF A SEMICONDUCTOR SUBSTRATE simplified abstract (Tokyo Electron Limited)

APA style

18112120. METHODS FOR RETAINING A PROCESSING LIQUID ON A SURFACE OF A SEMICONDUCTOR SUBSTRATE simplified abstract (Tokyo Electron Limited). (2024, August 23). WikiPatents, . Retrieved 22:01, September 18, 2024 from http://wikipatents.org/index.php?title=18112120._METHODS_FOR_RETAINING_A_PROCESSING_LIQUID_ON_A_SURFACE_OF_A_SEMICONDUCTOR_SUBSTRATE_simplified_abstract_(Tokyo_Electron_Limited)&oldid=221575.

MLA style

"18112120. METHODS FOR RETAINING A PROCESSING LIQUID ON A SURFACE OF A SEMICONDUCTOR SUBSTRATE simplified abstract (Tokyo Electron Limited)." WikiPatents, . 23 Aug 2024, 05:19 UTC. 18 Sep 2024, 22:01 <http://wikipatents.org/index.php?title=18112120._METHODS_FOR_RETAINING_A_PROCESSING_LIQUID_ON_A_SURFACE_OF_A_SEMICONDUCTOR_SUBSTRATE_simplified_abstract_(Tokyo_Electron_Limited)&oldid=221575>.

MHRA style

WikiPatents contributors, '18112120. METHODS FOR RETAINING A PROCESSING LIQUID ON A SURFACE OF A SEMICONDUCTOR SUBSTRATE simplified abstract (Tokyo Electron Limited)', WikiPatents, , 23 August 2024, 05:19 UTC, <http://wikipatents.org/index.php?title=18112120._METHODS_FOR_RETAINING_A_PROCESSING_LIQUID_ON_A_SURFACE_OF_A_SEMICONDUCTOR_SUBSTRATE_simplified_abstract_(Tokyo_Electron_Limited)&oldid=221575> [accessed 18 September 2024]

Chicago style

WikiPatents contributors, "18112120. METHODS FOR RETAINING A PROCESSING LIQUID ON A SURFACE OF A SEMICONDUCTOR SUBSTRATE simplified abstract (Tokyo Electron Limited)," WikiPatents, , http://wikipatents.org/index.php?title=18112120._METHODS_FOR_RETAINING_A_PROCESSING_LIQUID_ON_A_SURFACE_OF_A_SEMICONDUCTOR_SUBSTRATE_simplified_abstract_(Tokyo_Electron_Limited)&oldid=221575 (accessed September 18, 2024).

CBE/CSE style

WikiPatents contributors. 18112120. METHODS FOR RETAINING A PROCESSING LIQUID ON A SURFACE OF A SEMICONDUCTOR SUBSTRATE simplified abstract (Tokyo Electron Limited) [Internet]. WikiPatents, ; 2024 Aug 23, 05:19 UTC [cited 2024 Sep 18]. Available from: http://wikipatents.org/index.php?title=18112120._METHODS_FOR_RETAINING_A_PROCESSING_LIQUID_ON_A_SURFACE_OF_A_SEMICONDUCTOR_SUBSTRATE_simplified_abstract_(Tokyo_Electron_Limited)&oldid=221575.

Bluebook style

18112120. METHODS FOR RETAINING A PROCESSING LIQUID ON A SURFACE OF A SEMICONDUCTOR SUBSTRATE simplified abstract (Tokyo Electron Limited), http://wikipatents.org/index.php?title=18112120._METHODS_FOR_RETAINING_A_PROCESSING_LIQUID_ON_A_SURFACE_OF_A_SEMICONDUCTOR_SUBSTRATE_simplified_abstract_(Tokyo_Electron_Limited)&oldid=221575 (last visited September 18, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18112120. METHODS FOR RETAINING A PROCESSING LIQUID ON A SURFACE OF A SEMICONDUCTOR SUBSTRATE simplified abstract (Tokyo Electron Limited) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18112120._METHODS_FOR_RETAINING_A_PROCESSING_LIQUID_ON_A_SURFACE_OF_A_SEMICONDUCTOR_SUBSTRATE_simplified_abstract_(Tokyo_Electron_Limited)&oldid=221575",
   note = "[Online; accessed 18-September-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18112120. METHODS FOR RETAINING A PROCESSING LIQUID ON A SURFACE OF A SEMICONDUCTOR SUBSTRATE simplified abstract (Tokyo Electron Limited) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18112120._METHODS_FOR_RETAINING_A_PROCESSING_LIQUID_ON_A_SURFACE_OF_A_SEMICONDUCTOR_SUBSTRATE_simplified_abstract_(Tokyo_Electron_Limited)&oldid=221575}",
   note = "[Online; accessed 18-September-2024]"
 }