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Bibliographic details for 18062231. OVERLAY CORRECTING METHOD, AND PHOTOLITHOGRAPHY METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SCANNER SYSTEM BASED ON THE OVERLAY CORRECTING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

Citation styles for 18062231. OVERLAY CORRECTING METHOD, AND PHOTOLITHOGRAPHY METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SCANNER SYSTEM BASED ON THE OVERLAY CORRECTING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

APA style

18062231. OVERLAY CORRECTING METHOD, AND PHOTOLITHOGRAPHY METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SCANNER SYSTEM BASED ON THE OVERLAY CORRECTING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.). (2024, January 2). WikiPatents, . Retrieved 20:40, June 15, 2024 from http://wikipatents.org/index.php?title=18062231._OVERLAY_CORRECTING_METHOD,_AND_PHOTOLITHOGRAPHY_METHOD,_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_AND_SCANNER_SYSTEM_BASED_ON_THE_OVERLAY_CORRECTING_METHOD_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=20421.

MLA style

"18062231. OVERLAY CORRECTING METHOD, AND PHOTOLITHOGRAPHY METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SCANNER SYSTEM BASED ON THE OVERLAY CORRECTING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)." WikiPatents, . 2 Jan 2024, 05:18 UTC. 15 Jun 2024, 20:40 <http://wikipatents.org/index.php?title=18062231._OVERLAY_CORRECTING_METHOD,_AND_PHOTOLITHOGRAPHY_METHOD,_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_AND_SCANNER_SYSTEM_BASED_ON_THE_OVERLAY_CORRECTING_METHOD_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=20421>.

MHRA style

WikiPatents contributors, '18062231. OVERLAY CORRECTING METHOD, AND PHOTOLITHOGRAPHY METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SCANNER SYSTEM BASED ON THE OVERLAY CORRECTING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)', WikiPatents, , 2 January 2024, 05:18 UTC, <http://wikipatents.org/index.php?title=18062231._OVERLAY_CORRECTING_METHOD,_AND_PHOTOLITHOGRAPHY_METHOD,_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_AND_SCANNER_SYSTEM_BASED_ON_THE_OVERLAY_CORRECTING_METHOD_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=20421> [accessed 15 June 2024]

Chicago style

WikiPatents contributors, "18062231. OVERLAY CORRECTING METHOD, AND PHOTOLITHOGRAPHY METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SCANNER SYSTEM BASED ON THE OVERLAY CORRECTING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)," WikiPatents, , http://wikipatents.org/index.php?title=18062231._OVERLAY_CORRECTING_METHOD,_AND_PHOTOLITHOGRAPHY_METHOD,_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_AND_SCANNER_SYSTEM_BASED_ON_THE_OVERLAY_CORRECTING_METHOD_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=20421 (accessed June 15, 2024).

CBE/CSE style

WikiPatents contributors. 18062231. OVERLAY CORRECTING METHOD, AND PHOTOLITHOGRAPHY METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SCANNER SYSTEM BASED ON THE OVERLAY CORRECTING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) [Internet]. WikiPatents, ; 2024 Jan 2, 05:18 UTC [cited 2024 Jun 15]. Available from: http://wikipatents.org/index.php?title=18062231._OVERLAY_CORRECTING_METHOD,_AND_PHOTOLITHOGRAPHY_METHOD,_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_AND_SCANNER_SYSTEM_BASED_ON_THE_OVERLAY_CORRECTING_METHOD_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=20421.

Bluebook style

18062231. OVERLAY CORRECTING METHOD, AND PHOTOLITHOGRAPHY METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SCANNER SYSTEM BASED ON THE OVERLAY CORRECTING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.), http://wikipatents.org/index.php?title=18062231._OVERLAY_CORRECTING_METHOD,_AND_PHOTOLITHOGRAPHY_METHOD,_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_AND_SCANNER_SYSTEM_BASED_ON_THE_OVERLAY_CORRECTING_METHOD_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=20421 (last visited June 15, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18062231. OVERLAY CORRECTING METHOD, AND PHOTOLITHOGRAPHY METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SCANNER SYSTEM BASED ON THE OVERLAY CORRECTING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18062231._OVERLAY_CORRECTING_METHOD,_AND_PHOTOLITHOGRAPHY_METHOD,_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_AND_SCANNER_SYSTEM_BASED_ON_THE_OVERLAY_CORRECTING_METHOD_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=20421",
   note = "[Online; accessed 15-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18062231. OVERLAY CORRECTING METHOD, AND PHOTOLITHOGRAPHY METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SCANNER SYSTEM BASED ON THE OVERLAY CORRECTING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18062231._OVERLAY_CORRECTING_METHOD,_AND_PHOTOLITHOGRAPHY_METHOD,_SEMICONDUCTOR_DEVICE_MANUFACTURING_METHOD_AND_SCANNER_SYSTEM_BASED_ON_THE_OVERLAY_CORRECTING_METHOD_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=20421}",
   note = "[Online; accessed 15-June-2024]"
 }


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