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Citation styles for 17873130. PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)

APA style

17873130. PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.). (2024, January 2). WikiPatents, . Retrieved 03:14, June 26, 2024 from http://wikipatents.org/index.php?title=17873130._PHOTORESIST_COMPOSITION_AND_METHOD_OF_FORMING_PHOTORESIST_PATTERN_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19540.

MLA style

"17873130. PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)." WikiPatents, . 2 Jan 2024, 02:59 UTC. 26 Jun 2024, 03:14 <http://wikipatents.org/index.php?title=17873130._PHOTORESIST_COMPOSITION_AND_METHOD_OF_FORMING_PHOTORESIST_PATTERN_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19540>.

MHRA style

WikiPatents contributors, '17873130. PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)', WikiPatents, , 2 January 2024, 02:59 UTC, <http://wikipatents.org/index.php?title=17873130._PHOTORESIST_COMPOSITION_AND_METHOD_OF_FORMING_PHOTORESIST_PATTERN_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19540> [accessed 26 June 2024]

Chicago style

WikiPatents contributors, "17873130. PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)," WikiPatents, , http://wikipatents.org/index.php?title=17873130._PHOTORESIST_COMPOSITION_AND_METHOD_OF_FORMING_PHOTORESIST_PATTERN_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19540 (accessed June 26, 2024).

CBE/CSE style

WikiPatents contributors. 17873130. PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) [Internet]. WikiPatents, ; 2024 Jan 2, 02:59 UTC [cited 2024 Jun 26]. Available from: http://wikipatents.org/index.php?title=17873130._PHOTORESIST_COMPOSITION_AND_METHOD_OF_FORMING_PHOTORESIST_PATTERN_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19540.

Bluebook style

17873130. PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.), http://wikipatents.org/index.php?title=17873130._PHOTORESIST_COMPOSITION_AND_METHOD_OF_FORMING_PHOTORESIST_PATTERN_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19540 (last visited June 26, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "17873130. PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=17873130._PHOTORESIST_COMPOSITION_AND_METHOD_OF_FORMING_PHOTORESIST_PATTERN_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19540",
   note = "[Online; accessed 26-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "17873130. PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=17873130._PHOTORESIST_COMPOSITION_AND_METHOD_OF_FORMING_PHOTORESIST_PATTERN_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=19540}",
   note = "[Online; accessed 26-June-2024]"
 }