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Bibliographic details for 18437321. DIFFUSION BARRIER LAYER FOR SOURCE AND DRAIN STRUCTURES TO INCREASE TRANSISTOR PERFORMANCE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)

Citation styles for 18437321. DIFFUSION BARRIER LAYER FOR SOURCE AND DRAIN STRUCTURES TO INCREASE TRANSISTOR PERFORMANCE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)

APA style

18437321. DIFFUSION BARRIER LAYER FOR SOURCE AND DRAIN STRUCTURES TO INCREASE TRANSISTOR PERFORMANCE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.). (2024, July 20). WikiPatents, . Retrieved 05:08, September 16, 2024 from http://wikipatents.org/index.php?title=18437321._DIFFUSION_BARRIER_LAYER_FOR_SOURCE_AND_DRAIN_STRUCTURES_TO_INCREASE_TRANSISTOR_PERFORMANCE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=178148.

MLA style

"18437321. DIFFUSION BARRIER LAYER FOR SOURCE AND DRAIN STRUCTURES TO INCREASE TRANSISTOR PERFORMANCE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)." WikiPatents, . 20 Jul 2024, 06:48 UTC. 16 Sep 2024, 05:08 <http://wikipatents.org/index.php?title=18437321._DIFFUSION_BARRIER_LAYER_FOR_SOURCE_AND_DRAIN_STRUCTURES_TO_INCREASE_TRANSISTOR_PERFORMANCE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=178148>.

MHRA style

WikiPatents contributors, '18437321. DIFFUSION BARRIER LAYER FOR SOURCE AND DRAIN STRUCTURES TO INCREASE TRANSISTOR PERFORMANCE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)', WikiPatents, , 20 July 2024, 06:48 UTC, <http://wikipatents.org/index.php?title=18437321._DIFFUSION_BARRIER_LAYER_FOR_SOURCE_AND_DRAIN_STRUCTURES_TO_INCREASE_TRANSISTOR_PERFORMANCE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=178148> [accessed 16 September 2024]

Chicago style

WikiPatents contributors, "18437321. DIFFUSION BARRIER LAYER FOR SOURCE AND DRAIN STRUCTURES TO INCREASE TRANSISTOR PERFORMANCE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=18437321._DIFFUSION_BARRIER_LAYER_FOR_SOURCE_AND_DRAIN_STRUCTURES_TO_INCREASE_TRANSISTOR_PERFORMANCE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=178148 (accessed September 16, 2024).

CBE/CSE style

WikiPatents contributors. 18437321. DIFFUSION BARRIER LAYER FOR SOURCE AND DRAIN STRUCTURES TO INCREASE TRANSISTOR PERFORMANCE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) [Internet]. WikiPatents, ; 2024 Jul 20, 06:48 UTC [cited 2024 Sep 16]. Available from: http://wikipatents.org/index.php?title=18437321._DIFFUSION_BARRIER_LAYER_FOR_SOURCE_AND_DRAIN_STRUCTURES_TO_INCREASE_TRANSISTOR_PERFORMANCE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=178148.

Bluebook style

18437321. DIFFUSION BARRIER LAYER FOR SOURCE AND DRAIN STRUCTURES TO INCREASE TRANSISTOR PERFORMANCE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.), http://wikipatents.org/index.php?title=18437321._DIFFUSION_BARRIER_LAYER_FOR_SOURCE_AND_DRAIN_STRUCTURES_TO_INCREASE_TRANSISTOR_PERFORMANCE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=178148 (last visited September 16, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18437321. DIFFUSION BARRIER LAYER FOR SOURCE AND DRAIN STRUCTURES TO INCREASE TRANSISTOR PERFORMANCE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18437321._DIFFUSION_BARRIER_LAYER_FOR_SOURCE_AND_DRAIN_STRUCTURES_TO_INCREASE_TRANSISTOR_PERFORMANCE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=178148",
   note = "[Online; accessed 16-September-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18437321. DIFFUSION BARRIER LAYER FOR SOURCE AND DRAIN STRUCTURES TO INCREASE TRANSISTOR PERFORMANCE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18437321._DIFFUSION_BARRIER_LAYER_FOR_SOURCE_AND_DRAIN_STRUCTURES_TO_INCREASE_TRANSISTOR_PERFORMANCE_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=178148}",
   note = "[Online; accessed 16-September-2024]"
 }


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