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Bibliographic details for Taiwan semiconductor manufacturing company, ltd. (20240243174). DIFFUSION BARRIER LAYER FOR SOURCE AND DRAIN STRUCTURES TO INCREASE TRANSISTOR PERFORMANCE simplified abstract
- Page name: Taiwan semiconductor manufacturing company, ltd. (20240243174). DIFFUSION BARRIER LAYER FOR SOURCE AND DRAIN STRUCTURES TO INCREASE TRANSISTOR PERFORMANCE simplified abstract
- Author: WikiPatents contributors
- Publisher: WikiPatents, .
- Date of last revision: 19 July 2024 03:18 UTC
- Date retrieved: 16 September 2024 05:19 UTC
- Permanent URL: http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240243174)._DIFFUSION_BARRIER_LAYER_FOR_SOURCE_AND_DRAIN_STRUCTURES_TO_INCREASE_TRANSISTOR_PERFORMANCE_simplified_abstract&oldid=152595
- Page Version ID: 152595
Citation styles for Taiwan semiconductor manufacturing company, ltd. (20240243174). DIFFUSION BARRIER LAYER FOR SOURCE AND DRAIN STRUCTURES TO INCREASE TRANSISTOR PERFORMANCE simplified abstract
APA style
Taiwan semiconductor manufacturing company, ltd. (20240243174). DIFFUSION BARRIER LAYER FOR SOURCE AND DRAIN STRUCTURES TO INCREASE TRANSISTOR PERFORMANCE simplified abstract. (2024, July 19). WikiPatents, . Retrieved 05:19, September 16, 2024 from http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240243174)._DIFFUSION_BARRIER_LAYER_FOR_SOURCE_AND_DRAIN_STRUCTURES_TO_INCREASE_TRANSISTOR_PERFORMANCE_simplified_abstract&oldid=152595.
MLA style
"Taiwan semiconductor manufacturing company, ltd. (20240243174). DIFFUSION BARRIER LAYER FOR SOURCE AND DRAIN STRUCTURES TO INCREASE TRANSISTOR PERFORMANCE simplified abstract." WikiPatents, . 19 Jul 2024, 03:18 UTC. 16 Sep 2024, 05:19 <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240243174)._DIFFUSION_BARRIER_LAYER_FOR_SOURCE_AND_DRAIN_STRUCTURES_TO_INCREASE_TRANSISTOR_PERFORMANCE_simplified_abstract&oldid=152595>.
MHRA style
WikiPatents contributors, 'Taiwan semiconductor manufacturing company, ltd. (20240243174). DIFFUSION BARRIER LAYER FOR SOURCE AND DRAIN STRUCTURES TO INCREASE TRANSISTOR PERFORMANCE simplified abstract', WikiPatents, , 19 July 2024, 03:18 UTC, <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240243174)._DIFFUSION_BARRIER_LAYER_FOR_SOURCE_AND_DRAIN_STRUCTURES_TO_INCREASE_TRANSISTOR_PERFORMANCE_simplified_abstract&oldid=152595> [accessed 16 September 2024]
Chicago style
WikiPatents contributors, "Taiwan semiconductor manufacturing company, ltd. (20240243174). DIFFUSION BARRIER LAYER FOR SOURCE AND DRAIN STRUCTURES TO INCREASE TRANSISTOR PERFORMANCE simplified abstract," WikiPatents, , http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240243174)._DIFFUSION_BARRIER_LAYER_FOR_SOURCE_AND_DRAIN_STRUCTURES_TO_INCREASE_TRANSISTOR_PERFORMANCE_simplified_abstract&oldid=152595 (accessed September 16, 2024).
CBE/CSE style
WikiPatents contributors. Taiwan semiconductor manufacturing company, ltd. (20240243174). DIFFUSION BARRIER LAYER FOR SOURCE AND DRAIN STRUCTURES TO INCREASE TRANSISTOR PERFORMANCE simplified abstract [Internet]. WikiPatents, ; 2024 Jul 19, 03:18 UTC [cited 2024 Sep 16]. Available from: http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240243174)._DIFFUSION_BARRIER_LAYER_FOR_SOURCE_AND_DRAIN_STRUCTURES_TO_INCREASE_TRANSISTOR_PERFORMANCE_simplified_abstract&oldid=152595.
Bluebook style
Taiwan semiconductor manufacturing company, ltd. (20240243174). DIFFUSION BARRIER LAYER FOR SOURCE AND DRAIN STRUCTURES TO INCREASE TRANSISTOR PERFORMANCE simplified abstract, http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240243174)._DIFFUSION_BARRIER_LAYER_FOR_SOURCE_AND_DRAIN_STRUCTURES_TO_INCREASE_TRANSISTOR_PERFORMANCE_simplified_abstract&oldid=152595 (last visited September 16, 2024).
BibTeX entry
@misc{ wiki:xxx, author = "WikiPatents", title = "Taiwan semiconductor manufacturing company, ltd. (20240243174). DIFFUSION BARRIER LAYER FOR SOURCE AND DRAIN STRUCTURES TO INCREASE TRANSISTOR PERFORMANCE simplified abstract --- WikiPatents{,} ", year = "2024", url = "http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240243174)._DIFFUSION_BARRIER_LAYER_FOR_SOURCE_AND_DRAIN_STRUCTURES_TO_INCREASE_TRANSISTOR_PERFORMANCE_simplified_abstract&oldid=152595", note = "[Online; accessed 16-September-2024]" }
When using the LaTeX package url (\usepackage{url}
somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:
@misc{ wiki:xxx, author = "WikiPatents", title = "Taiwan semiconductor manufacturing company, ltd. (20240243174). DIFFUSION BARRIER LAYER FOR SOURCE AND DRAIN STRUCTURES TO INCREASE TRANSISTOR PERFORMANCE simplified abstract --- WikiPatents{,} ", year = "2024", url = "\url{http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240243174)._DIFFUSION_BARRIER_LAYER_FOR_SOURCE_AND_DRAIN_STRUCTURES_TO_INCREASE_TRANSISTOR_PERFORMANCE_simplified_abstract&oldid=152595}", note = "[Online; accessed 16-September-2024]" }