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Bibliographic details for US Patent Application 18358508. Forming Low-Stress Silicon Nitride Layer Through Hydrogen Treatment simplified abstract

Citation styles for US Patent Application 18358508. Forming Low-Stress Silicon Nitride Layer Through Hydrogen Treatment simplified abstract

APA style

US Patent Application 18358508. Forming Low-Stress Silicon Nitride Layer Through Hydrogen Treatment simplified abstract. (2023, December 6). WikiPatents, . Retrieved 18:26, June 23, 2024 from http://wikipatents.org/index.php?title=US_Patent_Application_18358508._Forming_Low-Stress_Silicon_Nitride_Layer_Through_Hydrogen_Treatment_simplified_abstract&oldid=14603.

MLA style

"US Patent Application 18358508. Forming Low-Stress Silicon Nitride Layer Through Hydrogen Treatment simplified abstract." WikiPatents, . 6 Dec 2023, 08:35 UTC. 23 Jun 2024, 18:26 <http://wikipatents.org/index.php?title=US_Patent_Application_18358508._Forming_Low-Stress_Silicon_Nitride_Layer_Through_Hydrogen_Treatment_simplified_abstract&oldid=14603>.

MHRA style

WikiPatents contributors, 'US Patent Application 18358508. Forming Low-Stress Silicon Nitride Layer Through Hydrogen Treatment simplified abstract', WikiPatents, , 6 December 2023, 08:35 UTC, <http://wikipatents.org/index.php?title=US_Patent_Application_18358508._Forming_Low-Stress_Silicon_Nitride_Layer_Through_Hydrogen_Treatment_simplified_abstract&oldid=14603> [accessed 23 June 2024]

Chicago style

WikiPatents contributors, "US Patent Application 18358508. Forming Low-Stress Silicon Nitride Layer Through Hydrogen Treatment simplified abstract," WikiPatents, , http://wikipatents.org/index.php?title=US_Patent_Application_18358508._Forming_Low-Stress_Silicon_Nitride_Layer_Through_Hydrogen_Treatment_simplified_abstract&oldid=14603 (accessed June 23, 2024).

CBE/CSE style

WikiPatents contributors. US Patent Application 18358508. Forming Low-Stress Silicon Nitride Layer Through Hydrogen Treatment simplified abstract [Internet]. WikiPatents, ; 2023 Dec 6, 08:35 UTC [cited 2024 Jun 23]. Available from: http://wikipatents.org/index.php?title=US_Patent_Application_18358508._Forming_Low-Stress_Silicon_Nitride_Layer_Through_Hydrogen_Treatment_simplified_abstract&oldid=14603.

Bluebook style

US Patent Application 18358508. Forming Low-Stress Silicon Nitride Layer Through Hydrogen Treatment simplified abstract, http://wikipatents.org/index.php?title=US_Patent_Application_18358508._Forming_Low-Stress_Silicon_Nitride_Layer_Through_Hydrogen_Treatment_simplified_abstract&oldid=14603 (last visited June 23, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "US Patent Application 18358508. Forming Low-Stress Silicon Nitride Layer Through Hydrogen Treatment simplified abstract --- WikiPatents{,} ",
   year = "2023",
   url = "http://wikipatents.org/index.php?title=US_Patent_Application_18358508._Forming_Low-Stress_Silicon_Nitride_Layer_Through_Hydrogen_Treatment_simplified_abstract&oldid=14603",
   note = "[Online; accessed 23-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "US Patent Application 18358508. Forming Low-Stress Silicon Nitride Layer Through Hydrogen Treatment simplified abstract --- WikiPatents{,} ",
   year = "2023",
   url = "\url{http://wikipatents.org/index.php?title=US_Patent_Application_18358508._Forming_Low-Stress_Silicon_Nitride_Layer_Through_Hydrogen_Treatment_simplified_abstract&oldid=14603}",
   note = "[Online; accessed 23-June-2024]"
 }


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