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Bibliographic details for US Patent Application 18366136. EUV Lithography Mask With A Porous Reflective Multilayer Structure simplified abstract

Citation styles for US Patent Application 18366136. EUV Lithography Mask With A Porous Reflective Multilayer Structure simplified abstract

APA style

US Patent Application 18366136. EUV Lithography Mask With A Porous Reflective Multilayer Structure simplified abstract. (2023, December 6). WikiPatents, . Retrieved 18:13, September 22, 2024 from http://wikipatents.org/index.php?title=US_Patent_Application_18366136._EUV_Lithography_Mask_With_A_Porous_Reflective_Multilayer_Structure_simplified_abstract&oldid=14586.

MLA style

"US Patent Application 18366136. EUV Lithography Mask With A Porous Reflective Multilayer Structure simplified abstract." WikiPatents, . 6 Dec 2023, 08:33 UTC. 22 Sep 2024, 18:13 <http://wikipatents.org/index.php?title=US_Patent_Application_18366136._EUV_Lithography_Mask_With_A_Porous_Reflective_Multilayer_Structure_simplified_abstract&oldid=14586>.

MHRA style

WikiPatents contributors, 'US Patent Application 18366136. EUV Lithography Mask With A Porous Reflective Multilayer Structure simplified abstract', WikiPatents, , 6 December 2023, 08:33 UTC, <http://wikipatents.org/index.php?title=US_Patent_Application_18366136._EUV_Lithography_Mask_With_A_Porous_Reflective_Multilayer_Structure_simplified_abstract&oldid=14586> [accessed 22 September 2024]

Chicago style

WikiPatents contributors, "US Patent Application 18366136. EUV Lithography Mask With A Porous Reflective Multilayer Structure simplified abstract," WikiPatents, , http://wikipatents.org/index.php?title=US_Patent_Application_18366136._EUV_Lithography_Mask_With_A_Porous_Reflective_Multilayer_Structure_simplified_abstract&oldid=14586 (accessed September 22, 2024).

CBE/CSE style

WikiPatents contributors. US Patent Application 18366136. EUV Lithography Mask With A Porous Reflective Multilayer Structure simplified abstract [Internet]. WikiPatents, ; 2023 Dec 6, 08:33 UTC [cited 2024 Sep 22]. Available from: http://wikipatents.org/index.php?title=US_Patent_Application_18366136._EUV_Lithography_Mask_With_A_Porous_Reflective_Multilayer_Structure_simplified_abstract&oldid=14586.

Bluebook style

US Patent Application 18366136. EUV Lithography Mask With A Porous Reflective Multilayer Structure simplified abstract, http://wikipatents.org/index.php?title=US_Patent_Application_18366136._EUV_Lithography_Mask_With_A_Porous_Reflective_Multilayer_Structure_simplified_abstract&oldid=14586 (last visited September 22, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "US Patent Application 18366136. EUV Lithography Mask With A Porous Reflective Multilayer Structure simplified abstract --- WikiPatents{,} ",
   year = "2023",
   url = "http://wikipatents.org/index.php?title=US_Patent_Application_18366136._EUV_Lithography_Mask_With_A_Porous_Reflective_Multilayer_Structure_simplified_abstract&oldid=14586",
   note = "[Online; accessed 22-September-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "US Patent Application 18366136. EUV Lithography Mask With A Porous Reflective Multilayer Structure simplified abstract --- WikiPatents{,} ",
   year = "2023",
   url = "\url{http://wikipatents.org/index.php?title=US_Patent_Application_18366136._EUV_Lithography_Mask_With_A_Porous_Reflective_Multilayer_Structure_simplified_abstract&oldid=14586}",
   note = "[Online; accessed 22-September-2024]"
 }


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