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Bibliographic details for US Patent Application 18448505. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract

Citation styles for US Patent Application 18448505. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract

APA style

US Patent Application 18448505. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract. (2023, December 4). WikiPatents, . Retrieved 11:59, June 24, 2024 from http://wikipatents.org/index.php?title=US_Patent_Application_18448505._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_RESIST_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_MANUFACTURING_ELECTRONIC_DEVICE_simplified_abstract&oldid=11545.

MLA style

"US Patent Application 18448505. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract." WikiPatents, . 4 Dec 2023, 07:09 UTC. 24 Jun 2024, 11:59 <http://wikipatents.org/index.php?title=US_Patent_Application_18448505._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_RESIST_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_MANUFACTURING_ELECTRONIC_DEVICE_simplified_abstract&oldid=11545>.

MHRA style

WikiPatents contributors, 'US Patent Application 18448505. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract', WikiPatents, , 4 December 2023, 07:09 UTC, <http://wikipatents.org/index.php?title=US_Patent_Application_18448505._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_RESIST_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_MANUFACTURING_ELECTRONIC_DEVICE_simplified_abstract&oldid=11545> [accessed 24 June 2024]

Chicago style

WikiPatents contributors, "US Patent Application 18448505. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract," WikiPatents, , http://wikipatents.org/index.php?title=US_Patent_Application_18448505._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_RESIST_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_MANUFACTURING_ELECTRONIC_DEVICE_simplified_abstract&oldid=11545 (accessed June 24, 2024).

CBE/CSE style

WikiPatents contributors. US Patent Application 18448505. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract [Internet]. WikiPatents, ; 2023 Dec 4, 07:09 UTC [cited 2024 Jun 24]. Available from: http://wikipatents.org/index.php?title=US_Patent_Application_18448505._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_RESIST_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_MANUFACTURING_ELECTRONIC_DEVICE_simplified_abstract&oldid=11545.

Bluebook style

US Patent Application 18448505. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract, http://wikipatents.org/index.php?title=US_Patent_Application_18448505._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_RESIST_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_MANUFACTURING_ELECTRONIC_DEVICE_simplified_abstract&oldid=11545 (last visited June 24, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "US Patent Application 18448505. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract --- WikiPatents{,} ",
   year = "2023",
   url = "http://wikipatents.org/index.php?title=US_Patent_Application_18448505._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_RESIST_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_MANUFACTURING_ELECTRONIC_DEVICE_simplified_abstract&oldid=11545",
   note = "[Online; accessed 24-June-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "US Patent Application 18448505. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract --- WikiPatents{,} ",
   year = "2023",
   url = "\url{http://wikipatents.org/index.php?title=US_Patent_Application_18448505._ACTINIC_RAY-SENSITIVE_OR_RADIATION-SENSITIVE_RESIN_COMPOSITION,_RESIST_FILM,_PATTERN_FORMING_METHOD,_AND_METHOD_FOR_MANUFACTURING_ELECTRONIC_DEVICE_simplified_abstract&oldid=11545}",
   note = "[Online; accessed 24-June-2024]"
 }


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