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Create the page "ION BEAM APPLICATIONS" on this wiki! See also the search results found.
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- =DEVICE AND METHOD FOR TUNING A CHARGED PARTICLE BEAM POSITION= [[:Category:ION BEAM APPLICATIONS|ION BEAM APPLICATIONS]]4 KB (664 words) - 10:52, 25 January 2024
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- =ION BEAM DEPOSITION APPARATUS AND ION BEAM DEPOSITION METHOD USING THE SAME= ==ION BEAM DEPOSITION APPARATUS AND ION BEAM DEPOSITION METHOD USING THE SAME - A simplified explanation of the abstract2 KB (332 words) - 03:29, 4 March 2024
- ...between the ion sources. Beamline components modify the mass analyzed ion beam. ...s an ion implantation system with a mass analyzing magnet that can analyze ion beams from two different sources.4 KB (614 words) - 09:37, 30 January 2024
- =Removable Ion Source Capable Of Axial Or Cross Beam Ionization= ==Removable Ion Source Capable Of Axial Or Cross Beam Ionization - A simplified explanation of the abstract==4 KB (547 words) - 10:28, 19 January 2024
- =APPLYING INERT ION BEAM ETCHING FOR IMPROVING A PROFILE AND REPAIRING SIDEWALL DAMAGE FOR PHASE CHA ==APPLYING INERT ION BEAM ETCHING FOR IMPROVING A PROFILE AND REPAIRING SIDEWALL DAMAGE FOR PHASE CHA4 KB (539 words) - 05:27, 4 January 2024
- ...d particle beam. The apparatus includes an ion beam column and an electron beam column, both of which generate and direct their respective beams. The sampl * The apparatus includes an ion beam column and an electron beam column.3 KB (380 words) - 05:31, 2 February 2024
- ...VERY APPARATUS FOR USE IN ION-BASED RADIOTHERAPY AND A PLANNING METHOD FOR ION-BASED RADIOTHERAPY= ...VERY APPARATUS FOR USE IN ION-BASED RADIOTHERAPY AND A PLANNING METHOD FOR ION-BASED RADIOTHERAPY - A simplified explanation of the abstract==4 KB (523 words) - 09:34, 1 February 2024
- ...ng to acceleration gaps, and also define RF quadrupoles to defocus the ion beam in a perpendicular direction at the acceleration gaps. * The drift tubes guide an ion beam along a specific direction.3 KB (457 words) - 02:57, 16 April 2024
- 18367559. PROCESSING APPARATUS AND PROCESSING METHOD simplified abstract (Samsung Display Co., LTD.)...rget while maintaining a predetermined temperature or higher to facilitate ion-exchange between the processing target and materials of the mixture. * The second processing unit irradiates a beam into the same region of the processing target.4 KB (523 words) - 01:27, 6 June 2024
- =MOLTEN LIQUID TRANSPORT FOR TUNABLE VAPORIZATION IN ION SOURCES= ==MOLTEN LIQUID TRANSPORT FOR TUNABLE VAPORIZATION IN ION SOURCES - A simplified explanation of the abstract==3 KB (390 words) - 18:39, 1 January 2024
- ...ed temperature or higher. This process allows for efficient and controlled ion-exchange to occur. * The second processing unit irradiates a beam into the same region of the processing target.4 KB (501 words) - 07:18, 31 May 2024
- =ION EXTRACTION AND FOCUSING FROM A FIELD-FREE REGION TO AN ION MOBILITY SPECTROMETER AT ATMOSPHERIC PRESSURE= ==ION EXTRACTION AND FOCUSING FROM A FIELD-FREE REGION TO AN ION MOBILITY SPECTROMETER AT ATMOSPHERIC PRESSURE - A simplified explanation of4 KB (628 words) - 03:25, 9 February 2024
- =DEVICE AND METHOD FOR TUNING A CHARGED PARTICLE BEAM POSITION= [[:Category:ION BEAM APPLICATIONS|ION BEAM APPLICATIONS]]4 KB (664 words) - 10:52, 25 January 2024
- =MEMORY STRUCTURE WITH NON-ION BEAM ETCHED MTJ AND TOP ELECTRODE= ==MEMORY STRUCTURE WITH NON-ION BEAM ETCHED MTJ AND TOP ELECTRODE - A simplified explanation of the abstract==4 KB (517 words) - 02:14, 10 June 2024
- ...n includes a drift tube assembly with multiple drift tubes to guide an ion beam, a multi-gap configuration for acceleration, powered drift tubes receiving * The drift tube assembly consists of multiple drift tubes that guide an ion beam along a specific direction.4 KB (638 words) - 05:00, 25 March 2024
- ...beam onto the target, and a second ion gun for irradiating a hydrogen ion beam towards the substrate. * First ion gun for discharging deposition particles onto the substrate4 KB (606 words) - 07:07, 10 April 2024
- =ION EXTRACTION OPTICS HAVING NOVEL BLOCKER CONFIGURATION= ==ION EXTRACTION OPTICS HAVING NOVEL BLOCKER CONFIGURATION - A simplified explana4 KB (568 words) - 08:32, 14 June 2024
- ...r device by exposing specific locations within the device to a focused ion beam, with a focus on light-element ions such as helium or neon ions. * Focused ion beam used to alter operational characteristic of semiconductor device4 KB (508 words) - 04:13, 11 April 2024
- =OFF-AXIS ION EXTRACTION AND SHIELD GLASS ASSEMBLIES FOR SAMPLE ANALYSIS SYSTEMS= ==OFF-AXIS ION EXTRACTION AND SHIELD GLASS ASSEMBLIES FOR SAMPLE ANALYSIS SYSTEMS - A simp3 KB (505 words) - 02:43, 19 February 2024
- The abstract describes a cathode apparatus for an ion source, which includes a cathode with a positioning feature and a blind hol == Potential Applications ==3 KB (505 words) - 03:59, 2 February 2024
- ...accelerated by providing a first voltage to a target rod to create an ion beam that bombards a target. In the generating mode, a second voltage is provide ...accelerated by providing a first voltage to a target rod to create an ion beam.4 KB (531 words) - 04:05, 16 April 2024