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Show new changes starting from 23:27, 8 July 2024
   
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8 July 2024

N    04:58  17921254. METHODS FOR FORMING VIA HOLE AND FILLING VIA HOLE IN FLEXIBLE SUBSTRATE simplified abstract (Beijing BOE Technology Development Co., Ltd.)‎ diffhist +3,638‎ Wikipatents talk contribs Creating a new page
N    04:09  18411364. PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)‎ diffhist +4,269‎ Wikipatents talk contribs Creating a new page
N    04:08  18590518. SUPPORT FOR LITHOGRAPHIC PRINTING PLATE, LITHOGRAPHIC PRINTING PLATE PRECURSOR, AND METHOD OF PRODUCING LITHOGRAPHIC PRINTING PLATE simplified abstract (FUJIFILM Corporation)‎ diffhist +4,357‎ Wikipatents talk contribs Creating a new page

7 July 2024

N    16:58  18340535. SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS simplified abstract (SEMES CO., LTD.)‎ diffhist +3,548‎ Wikipatents talk contribs Creating a new page

6 July 2024

N    07:34  18603316. ANALYSIS METHOD simplified abstract (CANON KABUSHIKI KAISHA)‎ diffhist +3,642‎ Wikipatents talk contribs Creating a new page
N    07:33  18147261. GENERATING WHOLE SUBSTRATE DROP PATTERNS WITH REPEATING EVALUATION REGIONS simplified abstract (CANON KABUSHIKI KAISHA)‎ diffhist +4,114‎ Wikipatents talk contribs Creating a new page
N    07:13  18604127. METHOD AND APPARATUS FOR COATING PHOTO RESIST OVER A SUBSTRATE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)‎ diffhist +3,553‎ Wikipatents talk contribs Creating a new page
N    06:45  17921254. METHODS FOR FORMING VIA HOLE AND FILLING VIA HOLE IN FLEXIBLE SUBSTRATE simplified abstract (BOE TECHNOLOGY GROUP CO., LTD.)‎ diffhist +3,665‎ Wikipatents talk contribs Creating a new page

5 July 2024

N    06:30  18519497. EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)‎ diffhist +3,382‎ Wikipatents talk contribs Creating a new page
N    06:30  18460679. OVERLAY MEASUREMENT METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)‎ diffhist +3,944‎ Wikipatents talk contribs Creating a new page

4 July 2024

N    17:10  CANON KABUSHIKI KAISHA patent applications on July 4th, 2024‎ diffhist +63,980‎ Wikipatents talk contribs Creating a new page
N    17:08  Canon kabushiki kaisha (20240219871). ANALYSIS METHOD simplified abstract‎ diffhist +3,447‎ Wikipatents talk contribs Creating a new page
N    17:07  Canon kabushiki kaisha (20240219827). GENERATING WHOLE SUBSTRATE DROP PATTERNS WITH REPEATING EVALUATION REGIONS simplified abstract‎ diffhist +3,803‎ Wikipatents talk contribs Creating a new page
N    16:49  Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on July 4th, 2024‎ diffhist +89,952‎ Wikipatents talk contribs Creating a new page
N    16:45  Taiwan semiconductor manufacturing co., ltd. (20240222121). METHOD AND APPARATUS FOR COATING PHOTO RESIST OVER A SUBSTRATE simplified abstract‎ diffhist +2,978‎ Wikipatents talk contribs Creating a new page
N    16:13  SAMSUNG ELECTRONICS CO., LTD. patent applications on July 4th, 2024‎ diffhist +340,101‎ Wikipatents talk contribs Creating a new page
N    06:06  Samsung Electronics Co., Ltd. patent applications on July 4th, 2024‎ diffhist +340,101‎ Wikipatents talk contribs Creating a new page
N    05:47  Samsung electronics co., ltd. (20240219848). EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE simplified abstract‎ diffhist +3,579‎ Wikipatents talk contribs Creating a new page
N    05:47  Samsung electronics co., ltd. (20240219845). OVERLAY MEASUREMENT METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract‎ diffhist +3,537‎ Wikipatents talk contribs Creating a new page
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