Category:Jun Wang

Jun Wang

Executive Summary

Jun Wang is an inventor who has filed 2 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), {Finishing the coated layer, e.g. drying, baking, soaking} (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), and they have worked with companies such as ACM RESEARCH (SHANGHAI), INC. (2 patents). Their most frequent collaborators include (2 collaborations), (1 collaborations), (1 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

• G03F7/7075 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/168 ({Finishing the coated layer, e.g. drying, baking, soaking}): 1 patents
• G03F7/70533 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70825 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70933 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• C25D17/005 ({Contacting devices}): 1 patents
• C25D21/10 (Agitating of electrolytes; Moving of racks): 1 patents
• C25D21/12 (Process control or regulation (controlling or regulating in general): 1 patents

Companies

List of Companies

• ACM RESEARCH (SHANGHAI), INC.: 2 patents

Collaborators

• Hui Wang (2 collaborations)
• Mark Lee (1 collaborations)
• Jun Wu (1 collaborations)
• Cheng Cheng (1 collaborations)
• Andrew Jung (1 collaborations)
• Bruce Sohn (1 collaborations)
• Yy Kim (1 collaborations)
• Jian Wang (1 collaborations)
• Zhaowei Jia (1 collaborations)
• Yulu Hu (1 collaborations)