Samsung electronics co., ltd. (20250147419). RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME: Difference between revisions
Appearance
Wikipatents (talk | contribs) Creating a new page Tags: Manual revert Reverted |
Wikipatents (talk | contribs) Creating a new page Tags: Manual revert Reverted |
||
Line 1: | Line 1: | ||
<!-- JSON-LD markup for search engines: | <!-- JSON-LD markup for search engines: | ||
{"@context":"https://schema.org","@type":"TechArticle","headline":"RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME","name":"RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME","description":" | {"@context":"https://schema.org","@type":"TechArticle","headline":"RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME","name":"RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME","description":"\n","datePublished":"May 8th, 2025","mainEntity":{"@type":"Patent","identifier":"20250147419","name":"RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME","abstract":"\n","applicationNumber":"20250147419","datePublished":"May 8th, 2025","inventor":[{"@type":"Person","name":"Jungha CHAE"},{"@type":"Person","name":"Haengdeog KOH"},{"@type":"Person","name":"Yoonhyun KWAK"},{"@type":"Person","name":"Mijeong KIM"},{"@type":"Person","name":"Sunyoung LEE"},{"@type":"Person","name":"Jiyoun LEE"},{"@type":"Person","name":"Changheon LEE"},{"@type":"Person","name":"Jinwon JEON"}],"applicant":{"@type":"Organization","name":"samsung electronics co., ltd."},"additionalProperty":[{"@type":"PropertyValue","name":"IPC Classification","value":"G03F7/027"},{"@type":"PropertyValue","name":"CPC Classification","value":"G03F7/027"}]}} | ||
--> | --> | ||
Line 38: | Line 38: | ||
==Original Abstract Submitted== | ==Original Abstract Submitted== | ||
Revision as of 17:06, 14 May 2025
RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME
Organization Name
Inventor(s)
RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME
This abstract first appeared for US patent application 20250147419 titled 'RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME