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Samsung electronics co., ltd. (20250147415). RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME: Difference between revisions

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==Original Abstract Submitted==
==Original Abstract Submitted==


provided are a resist composition and a pattern formation method using the same. the resist composition may include an organometallic compound represented by one of formulae 1-1 to 1-4, and an additive represented by formula 2:
 
 
 





Latest revision as of 17:06, 14 May 2025


RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME

Organization Name

samsung electronics co., ltd.

Inventor(s)

Sunyoung Lee of Suwon-si KR

Haengdeog Koh of Suwon-si KR

Yoonhyun Kwak of Suwon-si KR

Jiyoun Lee of Suwon-si KR

Kyuhyun Im of Suwon-si KR

Jinwon Jeon of Suwon-si KR

Jungha Chae of Suwon-si KR

Minyoung Ha of Suwon-si KR

RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME

This abstract first appeared for US patent application 20250147415 titled 'RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME

Original Abstract Submitted

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