Samsung electronics co., ltd. (20250147415). RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME: Difference between revisions
Wikipatents (talk | contribs) Creating a new page Tags: Manual revert Reverted |
Wikipatents (talk | contribs) Creating a new page Tags: Manual revert Reverted |
||
| Line 1: | Line 1: | ||
<!-- JSON-LD markup for search engines: | <!-- JSON-LD markup for search engines: | ||
{"@context":"https://schema.org","@type":"TechArticle","headline":"RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME","name":"RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME","description":" | {"@context":"https://schema.org","@type":"TechArticle","headline":"RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME","name":"RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME","description":"provided are a resist composition and a pattern formation method using the same. the resist composition may include an organometallic compound represented by one of formulae 1-1 to 1-4, and an additiv...","datePublished":"May 8th, 2025","mainEntity":{"@type":"Patent","identifier":"20250147415","name":"RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME","abstract":"provided are a resist composition and a pattern formation method using the same. the resist composition may include an organometallic compound represented by one of formulae 1-1 to 1-4, and an additive represented by formula 2:","applicationNumber":"20250147415","datePublished":"May 8th, 2025","inventor":[{"@type":"Person","name":"Sunyoung LEE"},{"@type":"Person","name":"Haengdeog KOH"},{"@type":"Person","name":"Yoonhyun KWAK"},{"@type":"Person","name":"Jiyoun LEE"},{"@type":"Person","name":"Kyuhyun IM"},{"@type":"Person","name":"Jinwon JEON"},{"@type":"Person","name":"Jungha CHAE"},{"@type":"Person","name":"Minyoung HA"}],"applicant":{"@type":"Organization","name":"samsung electronics co., ltd."},"additionalProperty":[{"@type":"PropertyValue","name":"IPC Classification","value":"G03F7/004"},{"@type":"PropertyValue","name":"CPC Classification","value":"G03F7/0042"}]}} | ||
--> | --> | ||
| Line 38: | Line 38: | ||
==Original Abstract Submitted== | ==Original Abstract Submitted== | ||
provided are a resist composition and a pattern formation method using the same. the resist composition may include an organometallic compound represented by one of formulae 1-1 to 1-4, and an additive represented by formula 2: | |||
Revision as of 17:06, 14 May 2025
RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME
Organization Name
Inventor(s)
RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME
This abstract first appeared for US patent application 20250147415 titled 'RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME
Original Abstract Submitted
provided are a resist composition and a pattern formation method using the same. the resist composition may include an organometallic compound represented by one of formulae 1-1 to 1-4, and an additive represented by formula 2: