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	==Original Abstract Submitted==		==Original Abstract Submitted==

	provided are a resist composition and a method of forming a pattern by using the same, the resist composition including a polymer including a first repeating unit represented by formula 1, a photoacid generator, and an organic solvent:

Samsung electronics co., ltd. (20250123564). RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME: Difference between revisions