Category:Marco Jan-Jaco WIELAND: Difference between revisions

Latest revision as of 05:00, 30 March 2025

Marco Jan-Jaco WIELAND

Executive Summary

Marco Jan-Jaco WIELAND is an inventor who has filed 4 patents. Their primary areas of innovation include with scanning beams {( (3 patents), {Image processing arrangements associated with the tube (image data processing or generation, in general (2 patents), ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps (2 patents), and they have worked with companies such as ASML Netherlands B.V. (3 patents), ASML NETHERLANDS B.V. (1 patents). Their most frequent collaborators include (1 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

H01J37/28 (with scanning beams {(): 3 patents
H01J37/222 ({Image processing arrangements associated with the tube (image data processing or generation, in general): 2 patents
H01J37/244 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 2 patents
H01J2237/2817 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 2 patents
G06T7/0006 ({using a design-rule based approach}): 1 patents
G06T2207/10061 (Image acquisition modality): 1 patents
G06T2207/30148 (Subject of image; Context of image processing): 1 patents
H01J2237/221 (Treatment of data (mixing signals): 1 patents
H01J2237/24495 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
H01J2237/24592 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
H01J37/226 (Optical or photographic arrangements associated with the tube {(using a CRT for the display of the image in a scanning electron microscope): 1 patents
H01J37/153 (External mechanical adjustment of electron or ion optical components (): 1 patents
H01J37/12 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
H01J2237/0262 (Shields): 1 patents
H01J2237/0451 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
H01J2237/047 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
H01J2237/1202 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
H01J2237/1207 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
H01J2237/1534 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents

Companies

List of Companies

ASML Netherlands B.V.: 3 patents
ASML NETHERLANDS B.V.: 1 patents

Collaborators

Vincent Sylvester KUIPER (1 collaborations)

Subcategories

This category has the following 2 subcategories, out of 2 total.

A

► Albertus Victor Gerardus MANGNUS‎ (1 C)

M

► Marco Jan-Jaco WIELAND‎ (2 C)

@@ Line 2: / Line 2: @@
 === Executive Summary ===
-Marco Jan-Jaco WIELAND is an inventor who has filed 6 patents. Their primary areas of innovation include ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS  (spark-gaps (4 patents), ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS  (spark-gaps (2 patents), with scanning beams {( (2 patents), and they have worked with companies such as ASML Netherlands B.V. (6 patents). Their most frequent collaborators include [[Category:Marie-Claire VAN LARE|Marie-Claire VAN LARE]] (1 collaborations), [[Category:Vincent Sylvester KUIPER|Vincent Sylvester KUIPER]] (1 collaborations), [[Category:Albertus Victor Gerardus MANGNUS|Albertus Victor Gerardus MANGNUS]] (1 collaborations).
+Marco Jan-Jaco WIELAND is an inventor who has filed 4 patents. Their primary areas of innovation include with scanning beams {( (3 patents), {Image processing arrangements associated with the tube  (image data processing or generation, in general (2 patents), ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS  (spark-gaps (2 patents), and they have worked with companies such as ASML Netherlands B.V. (3 patents), ASML NETHERLANDS B.V. (1 patents). Their most frequent collaborators include [[Category:Vincent Sylvester KUIPER|Vincent Sylvester KUIPER]] (1 collaborations).
 === Patent Filing Activity ===
@@ Line 11: / Line 11: @@
 ==== List of Technology Areas ====
-* [[:Category:CPC_H01J37/244|H01J37/244]] (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS  (spark-gaps): 4 patents
+* [[:Category:CPC_H01J37/28|H01J37/28]] (with scanning beams {(): 3 patents
-* [[:Category:CPC_H01J37/12|H01J37/12]] (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS  (spark-gaps): 2 patents
+* [[:Category:CPC_H01J37/222|H01J37/222]] ({Image processing arrangements associated with the tube  (image data processing or generation, in general): 2 patents
-* [[:Category:CPC_H01J37/28|H01J37/28]] (with scanning beams {(): 2 patents
+* [[:Category:CPC_H01J37/244|H01J37/244]] (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS  (spark-gaps): 2 patents
 * [[:Category:CPC_H01J2237/2817|H01J2237/2817]] (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS  (spark-gaps): 2 patents
-* [[:Category:CPC_G01N23/2251|G01N23/2251]] (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES  (measuring or testing processes other than immunoassay, involving enzymes or microorganisms): 2 patents
+* [[:Category:CPC_G06T7/0006|G06T7/0006]] ({using a design-rule based approach}): 1 patents
+* [[:Category:CPC_G06T2207/10061|G06T2207/10061]] (Image acquisition modality): 1 patents
+* [[:Category:CPC_G06T2207/30148|G06T2207/30148]] (Subject of image; Context of image processing): 1 patents
+* [[:Category:CPC_H01J2237/221|H01J2237/221]] (Treatment of data  (mixing signals): 1 patents
+* [[:Category:CPC_H01J2237/24495|H01J2237/24495]] (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS  (spark-gaps): 1 patents
+* [[:Category:CPC_H01J2237/24592|H01J2237/24592]] (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS  (spark-gaps): 1 patents
+* [[:Category:CPC_H01J37/226|H01J37/226]] (Optical or photographic arrangements associated with the tube {(using a CRT for the display of the image in a scanning electron microscope): 1 patents
 * [[:Category:CPC_H01J37/153|H01J37/153]] (External mechanical adjustment of electron or ion optical components  (): 1 patents
+* [[:Category:CPC_H01J37/12|H01J37/12]] (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS  (spark-gaps): 1 patents
+* [[:Category:CPC_H01J2237/0262|H01J2237/0262]] (Shields): 1 patents
+* [[:Category:CPC_H01J2237/0451|H01J2237/0451]] (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS  (spark-gaps): 1 patents
+* [[:Category:CPC_H01J2237/047|H01J2237/047]] (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS  (spark-gaps): 1 patents
+* [[:Category:CPC_H01J2237/1202|H01J2237/1202]] (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS  (spark-gaps): 1 patents
+* [[:Category:CPC_H01J2237/1207|H01J2237/1207]] (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS  (spark-gaps): 1 patents
 * [[:Category:CPC_H01J2237/1534|H01J2237/1534]] (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS  (spark-gaps): 1 patents
-* [[:Category:CPC_H01J37/265|H01J37/265]] (Electron or ion microscopes; Electron or ion diffraction tubes): 1 patents
-* [[:Category:CPC_H01J2237/1205|H01J2237/1205]] (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS  (spark-gaps): 1 patents
-* [[:Category:CPC_H01J2237/1207|H01J2237/1207]] (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS  (spark-gaps): 1 patents
-* [[:Category:CPC_G03F7/70325|G03F7/70325]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
-* [[:Category:CPC_G03F7/70558|G03F7/70558]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
-* [[:Category:CPC_G03F7/7065|G03F7/7065]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
-* [[:Category:CPC_G03F7/70655|G03F7/70655]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices): 1 patents
-* [[:Category:CPC_G01N2223/6116|G01N2223/6116]] (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES  (measuring or testing processes other than immunoassay, involving enzymes or microorganisms): 1 patents
-* [[:Category:CPC_G01N2223/646|G01N2223/646]] (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES  (measuring or testing processes other than immunoassay, involving enzymes or microorganisms): 1 patents
-* [[:Category:CPC_H01J37/226|H01J37/226]] (Optical or photographic arrangements associated with the tube {(using a CRT for the display of the image in a scanning electron microscope): 1 patents
-* [[:Category:CPC_H01J37/20|H01J37/20]] (Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support {(introducing the objects): 1 patents
-* [[:Category:CPC_H01J2237/2482|H01J2237/2482]] (Optical means): 1 patents
-* [[:Category:CPC_H01J37/222|H01J37/222]] ({Image processing arrangements associated with the tube  (image data processing or generation, in general): 1 patents
-* [[:Category:CPC_H01J2237/221|H01J2237/221]] (Treatment of data  (mixing signals): 1 patents
-* [[:Category:CPC_H01J2237/24592|H01J2237/24592]] (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS  (spark-gaps): 1 patents
-* [[:Category:CPC_G01N23/203|G01N23/203]] (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES  (measuring or testing processes other than immunoassay, involving enzymes or microorganisms): 1 patents
-* [[:Category:CPC_H01J37/10|H01J37/10]] (Lenses): 1 patents
 === Companies ===
@@ Line 40: / Line 35: @@
 ==== List of Companies ====
-* ASML Netherlands B.V.: 6 patents
+* ASML Netherlands B.V.: 3 patents
+* ASML NETHERLANDS B.V.: 1 patents
 === Collaborators ===
-* [[:Category:Marie-Claire VAN LARE|Marie-Claire VAN LARE]][[Category:Marie-Claire VAN LARE]] (1 collaborations)
 * [[:Category:Vincent Sylvester KUIPER|Vincent Sylvester KUIPER]][[Category:Vincent Sylvester KUIPER]] (1 collaborations)
-* [[:Category:Albertus Victor Gerardus MANGNUS|Albertus Victor Gerardus MANGNUS]][[Category:Albertus Victor Gerardus MANGNUS]] (1 collaborations)
 [[Category:Marco Jan-Jaco WIELAND]]
 [[Category:Inventors]]
 [[Category:Inventors filing patents with ASML Netherlands B.V.]]
+[[Category:Inventors filing patents with ASML NETHERLANDS B.V.]]