Difference between revisions of "Category:Jun Wang"
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=== Executive Summary === | === Executive Summary === | ||
| − | Jun Wang is an inventor who has filed 2 patents. Their primary areas of innovation include | + | Jun Wang is an inventor who has filed 2 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), {Finishing the coated layer, e.g. drying, baking, soaking} (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), and they have worked with companies such as ACM RESEARCH (SHANGHAI), INC. (2 patents). Their most frequent collaborators include [[Category:Hui Wang|Hui Wang]] (2 collaborations), [[Category:Mark Lee|Mark Lee]] (1 collaborations), [[Category:Jun Wu|Jun Wu]] (1 collaborations). |
=== Patent Filing Activity === | === Patent Filing Activity === | ||
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==== List of Technology Areas ==== | ==== List of Technology Areas ==== | ||
| − | * [[:Category: | + | * [[:Category:CPC_G03F7/7075|G03F7/7075]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents |
| − | + | * [[:Category:CPC_G03F7/168|G03F7/168]] ({Finishing the coated layer, e.g. drying, baking, soaking}): 1 patents | |
| − | * [[:Category: | + | * [[:Category:CPC_G03F7/70533|G03F7/70533]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents |
| − | * [[:Category: | + | * [[:Category:CPC_G03F7/70825|G03F7/70825]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents |
| − | + | * [[:Category:CPC_G03F7/70933|G03F7/70933]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents | |
| − | * [[:Category: | + | * [[:Category:CPC_C25D17/005|C25D17/005]] ({Contacting devices}): 1 patents |
| − | + | * [[:Category:CPC_C25D21/10|C25D21/10]] (Agitating of electrolytes; Moving of racks): 1 patents | |
| − | * [[:Category: | + | * [[:Category:CPC_C25D21/12|C25D21/12]] (Process control or regulation (controlling or regulating in general): 1 patents |
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=== Companies === | === Companies === | ||
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==== List of Companies ==== | ==== List of Companies ==== | ||
| − | * | + | * ACM RESEARCH (SHANGHAI), INC.: 2 patents |
=== Collaborators === | === Collaborators === | ||
| − | * [[:Category: | + | * [[:Category:Hui Wang|Hui Wang]][[Category:Hui Wang]] (2 collaborations) |
| − | * [[:Category: | + | * [[:Category:Mark Lee|Mark Lee]][[Category:Mark Lee]] (1 collaborations) |
| − | * [[:Category: | + | * [[:Category:Jun Wu|Jun Wu]][[Category:Jun Wu]] (1 collaborations) |
| − | * [[:Category: | + | * [[:Category:Cheng Cheng|Cheng Cheng]][[Category:Cheng Cheng]] (1 collaborations) |
| − | * [[:Category: | + | * [[:Category:Andrew Jung|Andrew Jung]][[Category:Andrew Jung]] (1 collaborations) |
| − | * [[:Category: | + | * [[:Category:Bruce Sohn|Bruce Sohn]][[Category:Bruce Sohn]] (1 collaborations) |
| − | * [[:Category: | + | * [[:Category:Yy Kim|Yy Kim]][[Category:Yy Kim]] (1 collaborations) |
| − | + | * [[:Category:Jian Wang|Jian Wang]][[Category:Jian Wang]] (1 collaborations) | |
| − | * [[:Category: | + | * [[:Category:Zhaowei Jia|Zhaowei Jia]][[Category:Zhaowei Jia]] (1 collaborations) |
| − | * [[:Category: | + | * [[:Category:Yulu Hu|Yulu Hu]][[Category:Yulu Hu]] (1 collaborations) |
| − | * [[:Category: | ||
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[[Category:Jun Wang]] | [[Category:Jun Wang]] | ||
[[Category:Inventors]] | [[Category:Inventors]] | ||
| − | [[Category:Inventors filing patents with | + | [[Category:Inventors filing patents with ACM RESEARCH (SHANGHAI), INC.]] |
Latest revision as of 16:00, 21 July 2024
Contents
Jun Wang
Executive Summary
Jun Wang is an inventor who has filed 2 patents. Their primary areas of innovation include PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), {Finishing the coated layer, e.g. drying, baking, soaking} (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), and they have worked with companies such as ACM RESEARCH (SHANGHAI), INC. (2 patents). Their most frequent collaborators include (2 collaborations), (1 collaborations), (1 collaborations).
Patent Filing Activity
Technology Areas
List of Technology Areas
- G03F7/7075 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
- G03F7/168 ({Finishing the coated layer, e.g. drying, baking, soaking}): 1 patents
- G03F7/70533 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
- G03F7/70825 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
- G03F7/70933 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
- C25D17/005 ({Contacting devices}): 1 patents
- C25D21/10 (Agitating of electrolytes; Moving of racks): 1 patents
- C25D21/12 (Process control or regulation (controlling or regulating in general): 1 patents
Companies
List of Companies
- ACM RESEARCH (SHANGHAI), INC.: 2 patents
Collaborators
- Hui Wang (2 collaborations)
- Mark Lee (1 collaborations)
- Jun Wu (1 collaborations)
- Cheng Cheng (1 collaborations)
- Andrew Jung (1 collaborations)
- Bruce Sohn (1 collaborations)
- Yy Kim (1 collaborations)
- Jian Wang (1 collaborations)
- Zhaowei Jia (1 collaborations)
- Yulu Hu (1 collaborations)
Subcategories
This category has the following 25 subcategories, out of 25 total.
