Samsung electronics co., ltd. (20250147419). RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME: Difference between revisions
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RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME
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RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME
This abstract first appeared for US patent application 20250147419 titled 'RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME
Original Abstract Submitted
wherein m, m, lto l, lto l, a11 to a14, a21 to a24, rto r, rto r, b11 to b14, b21 to b24, yto y, and xto xin formulae 1-1 to 1-4 and 2 are as described in the specification.