Jump to content

Samsung electronics co., ltd. (20250147415). RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME: Difference between revisions

From WikiPatents
Creating a new page
Tags: Manual revert Reverted
Creating a new page
Tag: Manual revert
 
(3 intermediate revisions by the same user not shown)
(No difference)

Latest revision as of 17:06, 14 May 2025


RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME

Organization Name

samsung electronics co., ltd.

Inventor(s)

Sunyoung Lee of Suwon-si KR

Haengdeog Koh of Suwon-si KR

Yoonhyun Kwak of Suwon-si KR

Jiyoun Lee of Suwon-si KR

Kyuhyun Im of Suwon-si KR

Jinwon Jeon of Suwon-si KR

Jungha Chae of Suwon-si KR

Minyoung Ha of Suwon-si KR

RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME

This abstract first appeared for US patent application 20250147415 titled 'RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME

Original Abstract Submitted

Cookies help us deliver our services. By using our services, you agree to our use of cookies.