Difference between revisions of "Category:Henan Zhang of Albany NY (US)"
Jump to navigation
Jump to search
Wikipatents (talk | contribs) (Updating Category:Henan_Zhang_of_Albany_NY_(US)) |
Wikipatents (talk | contribs) (Updating Category:Henan_Zhang_of_Albany_NY_(US)) |
||
| Line 2: | Line 2: | ||
=== Executive Summary === | === Executive Summary === | ||
| − | Henan Zhang of Albany NY (US) is an inventor who has filed 7 patents. Their primary areas of innovation include | + | Henan Zhang of Albany NY (US) is an inventor who has filed 7 patents. Their primary areas of innovation include {by chemical means} (4 patents), Chemical or electrical treatment, e.g. electrolytic etching (to form insulating layers (3 patents), {by liquid etching only} (2 patents), and they have worked with companies such as Tokyo Electron Limited (7 patents). Their most frequent collaborators include [[Category:Shan Hu of Albany NY (US)|Shan Hu of Albany NY (US)]] (6 collaborations), [[Category:Sangita Kumari of Albany NY (US)|Sangita Kumari of Albany NY (US)]] (6 collaborations), [[Category:Peter Delia of Albany NY (US)|Peter Delia of Albany NY (US)]] (6 collaborations). |
=== Patent Filing Activity === | === Patent Filing Activity === | ||
| Line 11: | Line 11: | ||
==== List of Technology Areas ==== | ==== List of Technology Areas ==== | ||
| − | * [[:Category:CPC_H01L21/31111|H01L21/31111]] ( | + | * [[:Category:CPC_H01L21/31111|H01L21/31111]] ({by chemical means}): 4 patents |
| − | * [[:Category:CPC_H01L21/30604|H01L21/30604]] ( | + | * [[:Category:CPC_H01L21/30604|H01L21/30604]] (Chemical or electrical treatment, e.g. electrolytic etching (to form insulating layers): 3 patents |
| − | * [[:Category:CPC_H01L21/32134|H01L21/32134]] ( | + | * [[:Category:CPC_H01L21/32134|H01L21/32134]] ({by liquid etching only}): 2 patents |
| − | * [[:Category:CPC_H01L27/11582|H01L27/11582]] ( | + | * [[:Category:CPC_H01L27/11582|H01L27/11582]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents |
| − | * [[:Category:CPC_H01L21/31055|H01L21/31055]] ( | + | * [[:Category:CPC_H01L21/31055|H01L21/31055]] ({the removal being a chemical etching step, e.g. dry etching (etching per se): 1 patents |
| − | * [[:Category:CPC_H01L21/7682|H01L21/7682]] ( | + | * [[:Category:CPC_H01L21/7682|H01L21/7682]] (Applying interconnections to be used for carrying current between separate components within a device {comprising conductors and dielectrics}): 1 patents |
| − | * [[:Category:CPC_H01L21/76819|H01L21/76819]] ( | + | * [[:Category:CPC_H01L21/76819|H01L21/76819]] ({Smoothing of the dielectric (planarisation of insulating materials per se): 1 patents |
| − | * [[:Category:CPC_H01L21/76831|H01L21/76831]] ( | + | * [[:Category:CPC_H01L21/76831|H01L21/76831]] ({in via holes or trenches, e.g. non-conductive sidewall liners}): 1 patents |
=== Companies === | === Companies === | ||
Latest revision as of 09:06, 19 July 2024
Contents
Henan Zhang of Albany NY (US)
Executive Summary
Henan Zhang of Albany NY (US) is an inventor who has filed 7 patents. Their primary areas of innovation include {by chemical means} (4 patents), Chemical or electrical treatment, e.g. electrolytic etching (to form insulating layers (3 patents), {by liquid etching only} (2 patents), and they have worked with companies such as Tokyo Electron Limited (7 patents). Their most frequent collaborators include (6 collaborations), (6 collaborations), (6 collaborations).
Patent Filing Activity
_Monthly_Patent_Applications.png)
Technology Areas
_Top_Technology_Areas.png)
List of Technology Areas
- H01L21/31111 ({by chemical means}): 4 patents
- H01L21/30604 (Chemical or electrical treatment, e.g. electrolytic etching (to form insulating layers): 3 patents
- H01L21/32134 ({by liquid etching only}): 2 patents
- H01L27/11582 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
- H01L21/31055 ({the removal being a chemical etching step, e.g. dry etching (etching per se): 1 patents
- H01L21/7682 (Applying interconnections to be used for carrying current between separate components within a device {comprising conductors and dielectrics}): 1 patents
- H01L21/76819 ({Smoothing of the dielectric (planarisation of insulating materials per se): 1 patents
- H01L21/76831 ({in via holes or trenches, e.g. non-conductive sidewall liners}): 1 patents
Companies
_Top_Companies.png)
List of Companies
- Tokyo Electron Limited: 7 patents
Collaborators
- Shan Hu of Albany NY (US) (6 collaborations)
- Sangita Kumari of Albany NY (US) (6 collaborations)
- Peter Delia of Albany NY (US) (6 collaborations)
- Eric Chih-Fang Liu of Albany NY (US) (3 collaborations)
- Soo Doo Chae of Albany NY (US) (1 collaborations)
- Lior Huli of Albany NY (US) (1 collaborations)
- Steven Gueci of Albany NY (US) (1 collaborations)
- Hojin Kim of Albany NY (US) (1 collaborations)
- Na Young Bae of Albany NY (US) (1 collaborations)
- Robert Clark of Fremont CA (US) (1 collaborations)
Subcategories
This category has the following 5 subcategories, out of 5 total.
E
H
P
S
Pages in category "Henan Zhang of Albany NY (US)"
This category contains only the following page.
Categories:
- Shan Hu of Albany NY (US)
- Sangita Kumari of Albany NY (US)
- Peter Delia of Albany NY (US)
- Eric Chih-Fang Liu of Albany NY (US)
- Soo Doo Chae of Albany NY (US)
- Lior Huli of Albany NY (US)
- Steven Gueci of Albany NY (US)
- Hojin Kim of Albany NY (US)
- Na Young Bae of Albany NY (US)
- Robert Clark of Fremont CA (US)
- Henan Zhang of Albany NY (US)
- Inventors
- Inventors filing patents with Tokyo Electron Limited
