Taiwan semiconductor manufacturing company, ltd. (20250130490). METHODS OF REPAIRING EXTREME ULTRAVIOLET PHOTOMASKS: Difference between revisions
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=METHODS OF REPAIRING EXTREME ULTRAVIOLET PHOTOMASKS= | =METHODS OF REPAIRING EXTREME ULTRAVIOLET PHOTOMASKS= | ||
Latest revision as of 15:38, 29 April 2025
METHODS OF REPAIRING EXTREME ULTRAVIOLET PHOTOMASKS
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Hsiang-Chien Hsu of Hsinchu TW
METHODS OF REPAIRING EXTREME ULTRAVIOLET PHOTOMASKS
This abstract first appeared for US patent application 20250130490 titled 'METHODS OF REPAIRING EXTREME ULTRAVIOLET PHOTOMASKS
Original Abstract Submitted
a method for repairing a lithography mask is provided. the method includes receiving a lithography mask having a capping layer that includes a damaged region, identifying a location and a dimension of the damaged region of the capping layer, determining a repairing time duration based on the dimension of the damaged region of the capping layer, and forming a capping patch layer in the damaged region of the capping layer.
