Difference between revisions of "Kokusai Electric Corporation patent applications published on July 25th, 2024"
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| + | '''Summary of the patent applications from Kokusai Electric Corporation on July 25th, 2024''' | ||
| + | |||
| + | 1. **Summary**: | ||
| + | Kokusai Electric Corporation has recently filed patents for innovative substrate processing systems aimed at enhancing efficiency and quality in semiconductor manufacturing and related industries. These patents involve techniques such as heat conduction insulation, plasma generation regions, and film modification processes to improve substrate handling, heating, cooling, and overall processing control. | ||
| + | |||
| + | 2. **Key Points of Patents**: | ||
| + | * Process chamber with substrate supports and heat conduction insulator to suppress heat transfer. | ||
| + | * Rotatable table with supports for substrate processing and improved efficiency. | ||
| + | * Boat for supporting substrates, revolution part for rotation, and cooler for heating and cooling processes. | ||
| + | * Gas and microwave suppliers with stirrers for uniform distribution and enhanced processing efficiency. | ||
| + | * Buffer structure with plasma generation regions for efficient gas distribution and control. | ||
| + | |||
| + | 3. **Notable Applications**: | ||
| + | * Semiconductor manufacturing for optimized production efficiency. | ||
| + | * Thin film deposition processes for precise coatings. | ||
| + | * Solar panel production for improved energy conversion. | ||
| + | * Microelectronics industry for intricate pattern creation. | ||
| + | * Optics industry for specialized lens coatings. | ||
| + | * Biomedical field for controlled drug delivery systems. | ||
| + | |||
| + | |||
| + | |||
| + | |||
==Patent applications for Kokusai Electric Corporation on July 25th, 2024== | ==Patent applications for Kokusai Electric Corporation on July 25th, 2024== | ||
Revision as of 05:07, 26 July 2024
Summary of the patent applications from Kokusai Electric Corporation on July 25th, 2024
1. **Summary**: Kokusai Electric Corporation has recently filed patents for innovative substrate processing systems aimed at enhancing efficiency and quality in semiconductor manufacturing and related industries. These patents involve techniques such as heat conduction insulation, plasma generation regions, and film modification processes to improve substrate handling, heating, cooling, and overall processing control.
2. **Key Points of Patents**:
* Process chamber with substrate supports and heat conduction insulator to suppress heat transfer. * Rotatable table with supports for substrate processing and improved efficiency. * Boat for supporting substrates, revolution part for rotation, and cooler for heating and cooling processes. * Gas and microwave suppliers with stirrers for uniform distribution and enhanced processing efficiency. * Buffer structure with plasma generation regions for efficient gas distribution and control.
3. **Notable Applications**:
* Semiconductor manufacturing for optimized production efficiency. * Thin film deposition processes for precise coatings. * Solar panel production for improved energy conversion. * Microelectronics industry for intricate pattern creation. * Optics industry for specialized lens coatings. * Biomedical field for controlled drug delivery systems.
Contents
- 1 Patent applications for Kokusai Electric Corporation on July 25th, 2024
- 1.1 SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM (18597415)
- 1.2 PLASMA GENERATING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE (18624655)
- 1.3 METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM (18611093)
- 1.4 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM (18612221)
- 1.5 SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM (18402814)
- 1.6 SUBSTRATE PROCESSING APPARATUS, TRANSFER METHOD OF SUBSTRATE SUPPORT, RECORDING MEDIUM, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE (18421051)
Patent applications for Kokusai Electric Corporation on July 25th, 2024
SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM (18597415)
Main Inventor
Koei KURIBAYASHI
PLASMA GENERATING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE (18624655)
Main Inventor
Akihiro SATO
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM (18611093)
Main Inventor
Katsuyoshi HARADA
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM (18612221)
Main Inventor
Kazuya NABETA
SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM (18402814)
Main Inventor
Hideharu ITATANI
SUBSTRATE PROCESSING APPARATUS, TRANSFER METHOD OF SUBSTRATE SUPPORT, RECORDING MEDIUM, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE (18421051)
Main Inventor
Yukinori ABURATANI
