Difference between revisions of "Category:Jian Wang"
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=== Executive Summary === | === Executive Summary === | ||
| − | Jian Wang is an inventor who has filed | + | Jian Wang is an inventor who has filed 6 patents. Their primary areas of innovation include {Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells} (3 patents), Process control or regulation (controlling or regulating in general (3 patents), {Cell separation, e.g. membranes, diaphragms} (2 patents), and they have worked with companies such as ACM RESEARCH (SHANGHAI), INC. (6 patents). Their most frequent collaborators include [[Category:Hui Wang|Hui Wang]] (6 collaborations), [[Category:Hongchao Yang|Hongchao Yang]] (4 collaborations), [[Category:Zhaowei Jia|Zhaowei Jia]] (4 collaborations). |
=== Patent Filing Activity === | === Patent Filing Activity === | ||
| Line 11: | Line 11: | ||
==== List of Technology Areas ==== | ==== List of Technology Areas ==== | ||
| − | * [[:Category: | + | * [[:Category:CPC_C25D17/001|C25D17/001]] ({Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells}): 3 patents |
| − | * [[:Category: | + | * [[:Category:CPC_C25D21/12|C25D21/12]] (Process control or regulation (controlling or regulating in general): 3 patents |
| − | * [[:Category: | + | * [[:Category:CPC_C25D17/002|C25D17/002]] ({Cell separation, e.g. membranes, diaphragms}): 2 patents |
| − | * [[:Category: | + | * [[:Category:CPC_C25D21/10|C25D21/10]] (Agitating of electrolytes; Moving of racks): 2 patents |
| − | * [[:Category: | + | * [[:Category:CPC_C25D7/12|C25D7/12]] (Semiconductors): 2 patents |
| − | * [[:Category: | + | * [[:Category:CPC_B01D19/0036|B01D19/0036]] ({Flash degasification (the other groups take precedence)}): 1 patents |
| − | * [[:Category: | + | * [[:Category:CPC_B01D19/00|B01D19/00]] (Degasification of liquids): 1 patents |
| − | * [[:Category: | + | * [[:Category:CPC_B01D19/0031|B01D19/0031]] (Degasification of liquids): 1 patents |
| − | * [[:Category: | + | * [[:Category:CPC_B08B3/041|B08B3/041]] ({Cleaning travelling work}): 1 patents |
| − | * [[:Category: | + | * [[:Category:CPC_B08B3/08|B08B3/08]] (the liquid having chemical or dissolving effect (substances used, see the relevant classes)): 1 patents |
| − | * [[:Category: | + | * [[:Category:CPC_B08B3/10|B08B3/10]] (with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration): 1 patents |
| + | * [[:Category:CPC_B08B3/12|B08B3/12]] (by sonic or ultrasonic vibrations (washing or rinsing machines for crockery or tableware using sonic or ultrasonic waves): 1 patents | ||
| + | * [[:Category:CPC_B08B7/04|B08B7/04]] (CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL (brushes): 1 patents | ||
| + | * [[:Category:CPC_F04B15/04|F04B15/04]] (POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS (machines for liquids, or pumps, of rotary-piston or oscillating-piston type): 1 patents | ||
| + | * [[:Category:CPC_F04B23/00|F04B23/00]] (Pumping installations or systems (pumps characterised by combination with, or adaptation to, specific driving engines or motors): 1 patents | ||
| + | * [[:Category:CPC_H01L21/02052|H01L21/02052]] ({Wet cleaning only (): 1 patents | ||
| + | * [[:Category:CPC_H01L21/02057|H01L21/02057]] ({Cleaning during device manufacture}): 1 patents | ||
| + | * [[:Category:CPC_H01L21/67017|H01L21/67017]] ({Apparatus for fluid treatment (): 1 patents | ||
| + | * [[:Category:CPC_H01L21/67051|H01L21/67051]] (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents | ||
| + | * [[:Category:CPC_H01L21/67092|H01L21/67092]] ({Apparatus for mechanical treatment (or grinding or cutting, see the relevant groups in subclasses): 1 patents | ||
| + | * [[:Category:CPC_H01L21/67253|H01L21/67253]] (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents | ||
| + | * [[:Category:CPC_B08B2203/007|B08B2203/007]] (CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL (brushes): 1 patents | ||
| + | * [[:Category:CPC_F04B23/04|F04B23/04]] (POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS (machines for liquids, or pumps, of rotary-piston or oscillating-piston type): 1 patents | ||
| + | * [[:Category:CPC_C25D5/18|C25D5/18]] (PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR): 1 patents | ||
| + | * [[:Category:CPC_C25D7/123|C25D7/123]] ({Semiconductors first coated with a seed layer or a conductive layer}): 1 patents | ||
| + | * [[:Category:CPC_C25D17/06|C25D17/06]] (PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR): 1 patents | ||
| + | * [[:Category:CPC_C25D17/005|C25D17/005]] ({Contacting devices}): 1 patents | ||
| + | * [[:Category:CPC_C25D17/10|C25D17/10]] (Electrodes {, e.g. composition, counter electrode}): 1 patents | ||
| + | * [[:Category:CPC_H01L21/2885|H01L21/2885]] (from a liquid, e.g. electrolytic deposition): 1 patents | ||
=== Companies === | === Companies === | ||
| Line 27: | Line 45: | ||
==== List of Companies ==== | ==== List of Companies ==== | ||
| − | * | + | * ACM RESEARCH (SHANGHAI), INC.: 6 patents |
=== Collaborators === | === Collaborators === | ||
| − | * [[:Category: | + | * [[:Category:Hui Wang|Hui Wang]][[Category:Hui Wang]] (6 collaborations) |
| − | * [[:Category: | + | * [[:Category:Hongchao Yang|Hongchao Yang]][[Category:Hongchao Yang]] (4 collaborations) |
| − | * [[:Category: | + | * [[:Category:Zhaowei Jia|Zhaowei Jia]][[Category:Zhaowei Jia]] (4 collaborations) |
| − | * [[:Category: | + | * [[:Category:Yinuo Jin|Yinuo Jin]][[Category:Yinuo Jin]] (2 collaborations) |
| − | * [[:Category: | + | * [[:Category:Fuping Chen|Fuping Chen]][[Category:Fuping Chen]] (1 collaborations) |
| + | * [[:Category:Xi Wang|Xi Wang]][[Category:Xi Wang]] (1 collaborations) | ||
| + | * [[:Category:Shena Jia|Shena Jia]][[Category:Shena Jia]] (1 collaborations) | ||
| + | * [[:Category:Danying Wang|Danying Wang]][[Category:Danying Wang]] (1 collaborations) | ||
| + | * [[:Category:Chaowei Jiang|Chaowei Jiang]][[Category:Chaowei Jiang]] (1 collaborations) | ||
| + | * [[:Category:Yingwei Dai|Yingwei Dai]][[Category:Yingwei Dai]] (1 collaborations) | ||
| + | * [[:Category:Jun Wang|Jun Wang]][[Category:Jun Wang]] (1 collaborations) | ||
| + | * [[:Category:Yulu Hu|Yulu Hu]][[Category:Yulu Hu]] (1 collaborations) | ||
| + | * [[:Category:Jun Cai|Jun Cai]][[Category:Jun Cai]] (1 collaborations) | ||
| + | * [[:Category:Chenhua Lu|Chenhua Lu]][[Category:Chenhua Lu]] (1 collaborations) | ||
| + | * [[:Category:Jiaqi Li|Jiaqi Li]][[Category:Jiaqi Li]] (1 collaborations) | ||
| + | * [[:Category:Meng Wu|Meng Wu]][[Category:Meng Wu]] (1 collaborations) | ||
[[Category:Jian Wang]] | [[Category:Jian Wang]] | ||
[[Category:Inventors]] | [[Category:Inventors]] | ||
| − | [[Category:Inventors filing patents with | + | [[Category:Inventors filing patents with ACM RESEARCH (SHANGHAI), INC.]] |
Latest revision as of 16:00, 21 July 2024
Contents
Jian Wang
Executive Summary
Jian Wang is an inventor who has filed 6 patents. Their primary areas of innovation include {Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells} (3 patents), Process control or regulation (controlling or regulating in general (3 patents), {Cell separation, e.g. membranes, diaphragms} (2 patents), and they have worked with companies such as ACM RESEARCH (SHANGHAI), INC. (6 patents). Their most frequent collaborators include (6 collaborations), (4 collaborations), (4 collaborations).
Patent Filing Activity
Technology Areas
List of Technology Areas
- C25D17/001 ({Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells}): 3 patents
- C25D21/12 (Process control or regulation (controlling or regulating in general): 3 patents
- C25D17/002 ({Cell separation, e.g. membranes, diaphragms}): 2 patents
- C25D21/10 (Agitating of electrolytes; Moving of racks): 2 patents
- C25D7/12 (Semiconductors): 2 patents
- B01D19/0036 ({Flash degasification (the other groups take precedence)}): 1 patents
- B01D19/00 (Degasification of liquids): 1 patents
- B01D19/0031 (Degasification of liquids): 1 patents
- B08B3/041 ({Cleaning travelling work}): 1 patents
- B08B3/08 (the liquid having chemical or dissolving effect (substances used, see the relevant classes)): 1 patents
- B08B3/10 (with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration): 1 patents
- B08B3/12 (by sonic or ultrasonic vibrations (washing or rinsing machines for crockery or tableware using sonic or ultrasonic waves): 1 patents
- B08B7/04 (CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL (brushes): 1 patents
- F04B15/04 (POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS (machines for liquids, or pumps, of rotary-piston or oscillating-piston type): 1 patents
- F04B23/00 (Pumping installations or systems (pumps characterised by combination with, or adaptation to, specific driving engines or motors): 1 patents
- H01L21/02052 ({Wet cleaning only (): 1 patents
- H01L21/02057 ({Cleaning during device manufacture}): 1 patents
- H01L21/67017 ({Apparatus for fluid treatment (): 1 patents
- H01L21/67051 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents
- H01L21/67092 ({Apparatus for mechanical treatment (or grinding or cutting, see the relevant groups in subclasses): 1 patents
- H01L21/67253 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents
- B08B2203/007 (CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL (brushes): 1 patents
- F04B23/04 (POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS (machines for liquids, or pumps, of rotary-piston or oscillating-piston type): 1 patents
- C25D5/18 (PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR): 1 patents
- C25D7/123 ({Semiconductors first coated with a seed layer or a conductive layer}): 1 patents
- C25D17/06 (PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR): 1 patents
- C25D17/005 ({Contacting devices}): 1 patents
- C25D17/10 (Electrodes {, e.g. composition, counter electrode}): 1 patents
- H01L21/2885 (from a liquid, e.g. electrolytic deposition): 1 patents
Companies
List of Companies
- ACM RESEARCH (SHANGHAI), INC.: 6 patents
Collaborators
- Hui Wang (6 collaborations)
- Hongchao Yang (4 collaborations)
- Zhaowei Jia (4 collaborations)
- Yinuo Jin (2 collaborations)
- Fuping Chen (1 collaborations)
- Xi Wang (1 collaborations)
- Shena Jia (1 collaborations)
- Danying Wang (1 collaborations)
- Chaowei Jiang (1 collaborations)
- Yingwei Dai (1 collaborations)
- Jun Wang (1 collaborations)
- Yulu Hu (1 collaborations)
- Jun Cai (1 collaborations)
- Chenhua Lu (1 collaborations)
- Jiaqi Li (1 collaborations)
- Meng Wu (1 collaborations)
Subcategories
This category has the following 10 subcategories, out of 10 total.
