Category:Michael Kocsis of Albany OR (US): Difference between revisions
Updating Category:Michael_Kocsis_of_Albany_OR_(US) |
Updating Category:Michael_Kocsis_of_Albany_OR_(US) |
||
| Line 2: | Line 2: | ||
=== Executive Summary === | === Executive Summary === | ||
Michael Kocsis of Albany OR (US) is an inventor who has filed 1 patents. Their primary areas of innovation include | Michael Kocsis of Albany OR (US) is an inventor who has filed 1 patents. Their primary areas of innovation include Macromolecular compounds which are photodegradable, e.g. positive electron resists ( (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), and they have worked with companies such as Inpria Corporation (1 patents). Their most frequent collaborators include [[Category:Peter De Schepper|Peter De Schepper]] (1 collaborations), [[Category:Jason K. Stowers of Corvallis OR (US)|Jason K. Stowers of Corvallis OR (US)]] (1 collaborations), [[Category:Sangyoon Woo|Sangyoon Woo]] (1 collaborations). | ||
=== Patent Filing Activity === | === Patent Filing Activity === | ||
| Line 11: | Line 11: | ||
==== List of Technology Areas ==== | ==== List of Technology Areas ==== | ||
* [[:Category:CPC_G03F7/0392|G03F7/0392]] ( | * [[:Category:CPC_G03F7/0392|G03F7/0392]] (Macromolecular compounds which are photodegradable, e.g. positive electron resists (): 1 patents | ||
* [[:Category:CPC_G03F1/22|G03F1/22]] ( | * [[:Category:CPC_G03F1/22|G03F1/22]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents | ||
* [[:Category:CPC_G03F1/48|G03F1/48]] ( | * [[:Category:CPC_G03F1/48|G03F1/48]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents | ||
* [[:Category:CPC_G03F7/0017|G03F7/0017]] ( | * [[:Category:CPC_G03F7/0017|G03F7/0017]] ({Phase modulating patterns, e.g. refractive index patterns}): 1 patents | ||
* [[:Category:CPC_G03F7/0042|G03F7/0042]] ( | * [[:Category:CPC_G03F7/0042|G03F7/0042]] ({with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists (): 1 patents | ||
* [[:Category:CPC_G03F7/0382|G03F7/0382]] ( | * [[:Category:CPC_G03F7/0382|G03F7/0382]] (Macromolecular compounds which are rendered insoluble or differentially wettable (): 1 patents | ||
* [[:Category:CPC_G03F7/11|G03F7/11]] ( | * [[:Category:CPC_G03F7/11|G03F7/11]] (having cover layers or intermediate layers, e.g. subbing layers {(): 1 patents | ||
* [[:Category:CPC_G03F7/2004|G03F7/2004]] ( | * [[:Category:CPC_G03F7/2004|G03F7/2004]] (Exposure; Apparatus therefor (photographic printing apparatus for making copies): 1 patents | ||
* [[:Category:CPC_G03F7/2037|G03F7/2037]] ( | * [[:Category:CPC_G03F7/2037|G03F7/2037]] (Exposure; Apparatus therefor (photographic printing apparatus for making copies): 1 patents | ||
* [[:Category:CPC_G03F7/42|G03F7/42]] ( | * [[:Category:CPC_G03F7/42|G03F7/42]] (Stripping or agents therefor): 1 patents | ||
=== Companies === | === Companies === | ||
Latest revision as of 07:13, 19 July 2024
Michael Kocsis of Albany OR (US)
Executive Summary
Michael Kocsis of Albany OR (US) is an inventor who has filed 1 patents. Their primary areas of innovation include Macromolecular compounds which are photodegradable, e.g. positive electron resists ( (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (1 patents), and they have worked with companies such as Inpria Corporation (1 patents). Their most frequent collaborators include (1 collaborations), (1 collaborations), (1 collaborations).
Patent Filing Activity
Error creating thumbnail: File missing
_Monthly_Patent_Applications.png){kind=link}
Technology Areas
_Top_Technology_Areas.png)
List of Technology Areas
- G03F7/0392 (Macromolecular compounds which are photodegradable, e.g. positive electron resists (): 1 patents
- G03F1/22 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
- G03F1/48 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
- G03F7/0017 ({Phase modulating patterns, e.g. refractive index patterns}): 1 patents
- G03F7/0042 ({with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists (): 1 patents
- G03F7/0382 (Macromolecular compounds which are rendered insoluble or differentially wettable (): 1 patents
- G03F7/11 (having cover layers or intermediate layers, e.g. subbing layers {(): 1 patents
- G03F7/2004 (Exposure; Apparatus therefor (photographic printing apparatus for making copies): 1 patents
- G03F7/2037 (Exposure; Apparatus therefor (photographic printing apparatus for making copies): 1 patents
- G03F7/42 (Stripping or agents therefor): 1 patents
Companies
_Top_Companies.png)
List of Companies
- Inpria Corporation: 1 patents
Collaborators
- Peter De Schepper (1 collaborations)
- Jason K. Stowers of Corvallis OR (US) (1 collaborations)
- Sangyoon Woo (1 collaborations)
- Alan J. Telecky of Albany OR (US) (1 collaborations)
Subcategories
This category has the following 5 subcategories, out of 5 total.