Samsung electronics co., ltd. (20250123564). RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME: Difference between revisions
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==Original Abstract Submitted== | ==Original Abstract Submitted== | ||
provided are a resist composition and a method of forming a pattern by using the same, the resist composition including a polymer including a first repeating unit represented by formula 1, a photoacid generator, and an organic solvent: | |||
Revision as of 10:06, 18 April 2025
RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME
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RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME
This abstract first appeared for US patent application 20250123564 titled 'RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME
Original Abstract Submitted
provided are a resist composition and a method of forming a pattern by using the same, the resist composition including a polymer including a first repeating unit represented by formula 1, a photoacid generator, and an organic solvent:
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