Jump to content

Samsung electronics co., ltd. (20250123564). RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME: Difference between revisions

From WikiPatents
Creating a new page
Tags: Manual revert Reverted
Creating a new page
Tag: Manual revert
 
(8 intermediate revisions by the same user not shown)
Line 28: Line 28:
==Original Abstract Submitted==
==Original Abstract Submitted==


provided are a resist composition and a method of forming a pattern by using the same, the resist composition including a polymer including a first repeating unit represented by formula 1, a photoacid generator, and an organic solvent:
 
 
 





Latest revision as of 05:20, 23 April 2025

RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME

Organization Name

samsung electronics co., ltd.

Inventor(s)

Chanjae Ahn of Suwon-si KR

Myungwoong Kim of Incheon KR

Yoonhyun Kwak of Suwon-si KR

Yunhee Ko of Incheon KR

Seungjun Kim of Incheon KR

RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME

This abstract first appeared for US patent application 20250123564 titled 'RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME

Original Abstract Submitted

(Ad) Transform your business with AI in minutes, not months

Custom AI strategy for your specific industry
Step-by-step implementation with clear ROI
5-minute setup - no technical skills needed
Get your AI playbook
Cookies help us deliver our services. By using our services, you agree to our use of cookies.