View source for Tokyo electron limited (20250149307). PLASMA PROCESSING APPARATUS

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=PLASMA PROCESSING APPARATUS=


==Organization Name==

[[:Category:tokyo electron limited|tokyo electron limited]]


[[Category:tokyo electron limited]]

==Inventor(s)==

[[:Category:Nozomu Nagashima of Miyagi JP|Nozomu Nagashima of Miyagi JP]][[Category:Nozomu Nagashima of Miyagi JP]]

[[:Category:Daisuke Yoshikoshi of Miyagi JP|Daisuke Yoshikoshi of Miyagi JP]][[Category:Daisuke Yoshikoshi of Miyagi JP]]

[[:Category:Kunihiko Yamagata of Miyagi JP|Kunihiko Yamagata of Miyagi JP]][[Category:Kunihiko Yamagata of Miyagi JP]]

==PLASMA PROCESSING APPARATUS==


This abstract first appeared for US patent application 20250149307 titled 'PLASMA PROCESSING APPARATUS

==Original Abstract Submitted==

provided is a plasma processing apparatus comprising: a plasma processing chamber; a substrate support; a high frequency power supply; an electrode or an antenna electrically connected to the high frequency power supply; a power consuming member disposed within the plasma processing chamber or the substrate support; an electricity storage unit electrically connected to the power consuming member; a power transmitting coil provided outside the plasma processing chamber; a power receiving coil electrically connected to the electricity storage unit and capable of receiving power from the power transmitting coil; at least one metal case that provides a shielded space and accommodates the power transmitting coil and the power receiving coil within the shielded space; and at least one ferrite material that is disposed within the shielded space and is provided to close a space in which the power transmitting coil and the power receiving coil are disposed.



[[Category:H01J37/32]]
[[Category:CPC_H01J37/32651]]