View source for Tokyo electron limited (20240295024). SUBSTRATE PROCESSING APPARATUS simplified abstract

=SUBSTRATE PROCESSING APPARATUS=


==Organization Name==

[[:Category:tokyo electron limited|tokyo electron limited]]


[[Category:tokyo electron limited]]

==Inventor(s)==

[[:Category:Makoto Takahashi of Iwate (JP)|Makoto Takahashi of Iwate (JP)]][[Category:Makoto Takahashi of Iwate (JP)]]

[[:Category:Masato Kadobe of Tokyo (JP)|Masato Kadobe of Tokyo (JP)]][[Category:Masato Kadobe of Tokyo (JP)]]

[[:Category:Tatsuya Yamaguchi of Tokyo (JP)|Tatsuya Yamaguchi of Tokyo (JP)]][[Category:Tatsuya Yamaguchi of Tokyo (JP)]]

==SUBSTRATE PROCESSING APPARATUS - A simplified explanation of the abstract==


This abstract first appeared for US patent application 20240295024 titled 'SUBSTRATE PROCESSING APPARATUS

The abstract describes a substrate processing apparatus with a gas supply chamber and an injector for supplying gas to the processing container.

*Simplified Explanation:
- The apparatus can hold a substrate holder for substrates.
- It has a gas supply chamber in the side wall.
- A supply-side pipe extends horizontally from the gas supply chamber.
- An injector is detachably disposed spanning through the gas supply chamber and the supply-side pipe.

*Key Features and Innovation:
- Gas supply chamber in the side wall of the processing container.
- Horizontal supply-side pipe for gas delivery.
- Detachable injector for gas supply.

*Potential Applications:
- Semiconductor manufacturing.
- Thin film deposition processes.
- Solar panel production.

*Problems Solved:
- Efficient gas supply to the processing container.
- Enhanced substrate processing capabilities.

*Benefits:
- Improved substrate processing efficiency.
- Precise gas delivery control.
- Increased production yield.

*Commercial Applications:
- Title: Gas Supply System for Substrate Processing Apparatus.
- Potential use in semiconductor industry.
- Market implications in electronics manufacturing.

*Questions about Gas Supply Systems:
1. How does the gas supply chamber enhance substrate processing efficiency?
- The gas supply chamber allows for precise control and delivery of gas to the processing container, optimizing the substrate processing conditions.

2. What are the advantages of using a horizontal supply-side pipe in the apparatus?
- The horizontal supply-side pipe ensures uniform gas distribution across the substrate surface, improving processing quality.


==Original Abstract Submitted==

a substrate processing apparatus includes: a processing container capable of accommodating a substrate holder that holds substrates; a gas supply chamber provided in a side wall of the processing container, a supply-side pipe extending horizontally from the gas supply chamber, and an injector detachably disposed spanning through the gas supply chamber and the supply-side pipe.



[[Category:C23C16/455]]
[[Category:C23C16/48]]
[[Category:CPC_C23C16/45548]]