View source for Samsung electronics co., ltd. (20240317622). ULTRAPURE WATER PRODUCTION SYSTEM, SEMICONDUCTOR PROCESSING SYSTEM INCLUDING THE SAME, AND SEMICONDUCTOR FABRICATION METHOD USING THE SAME simplified abstract

=ULTRAPURE WATER PRODUCTION SYSTEM, SEMICONDUCTOR PROCESSING SYSTEM INCLUDING THE SAME, AND SEMICONDUCTOR FABRICATION METHOD USING THE SAME=


==Organization Name==

[[:Category:samsung electronics co., ltd.|samsung electronics co., ltd.]]


[[Category:samsung electronics co., ltd.]]

==Inventor(s)==

[[:Category:Juhui Park of Suwon-si (KR)|Juhui Park of Suwon-si (KR)]][[Category:Juhui Park of Suwon-si (KR)]]

[[:Category:Jongha Yun of Suwon-si (KR)|Jongha Yun of Suwon-si (KR)]][[Category:Jongha Yun of Suwon-si (KR)]]

[[:Category:Younhaeng Lee of Suwon-si (KR)|Younhaeng Lee of Suwon-si (KR)]][[Category:Younhaeng Lee of Suwon-si (KR)]]

==ULTRAPURE WATER PRODUCTION SYSTEM, SEMICONDUCTOR PROCESSING SYSTEM INCLUDING THE SAME, AND SEMICONDUCTOR FABRICATION METHOD USING THE SAME - A simplified explanation of the abstract==


This abstract first appeared for US patent application 20240317622 titled 'ULTRAPURE WATER PRODUCTION SYSTEM, SEMICONDUCTOR PROCESSING SYSTEM INCLUDING THE SAME, AND SEMICONDUCTOR FABRICATION METHOD USING THE SAME

Abstract: Disclosed are ultrapure water production systems, semiconductor processing systems, and semiconductor fabrication methods. An ultrapure water production system may include a front filtering part that filters a fluid and a rear filtering part that filters the fluid released from the front filtering part. The rear filtering part may include a UV irradiator that irradiates a UV ray to the fluid to remove an organic material from the fluid, an ANP that removes hydrogen peroxide from the fluid released from the UV irradiator, a connection line that connects the UV irradiator to the ANP, a hydrogen peroxide detector that is on the connection line and detects a concentration of hydrogen peroxide in the fluid released from the UV irradiator, and a DO detector between the hydrogen peroxide detector and the ANP to measure a concentration of dissolved oxygen in the fluid released from the UV irradiator.

Key Features and Innovation:
* Front and rear filtering parts for ultrapure water production
* UV irradiator to remove organic material from the fluid
* ANP to remove hydrogen peroxide
* Hydrogen peroxide detector and DO detector for monitoring fluid quality

Potential Applications:
- Semiconductor manufacturing
- Pharmaceutical production
- Laboratory research

Problems Solved:
- Ensuring high purity of water for sensitive processes
- Monitoring and removing contaminants effectively

Benefits:
- Improved quality of ultrapure water
- Enhanced efficiency in semiconductor fabrication processes
- Reduced risk of contamination in critical applications

Commercial Applications:
Title: Ultrpure Water Production System for Semiconductor Processing
This technology can be used in semiconductor manufacturing facilities, pharmaceutical labs, and research institutions to ensure the highest quality of water for critical processes.

Prior Art:
Readers can explore prior patents related to ultrapure water production systems, semiconductor processing, and water purification technologies to understand the evolution of this innovation.

Frequently Updated Research:
Stay updated on advancements in ultrapure water production systems, semiconductor processing, and water treatment technologies to enhance the efficiency and effectiveness of these processes.

Questions about Ultrpure Water Production Systems:
1. How does the UV irradiator work to remove organic material from the fluid?
UV irradiation breaks down organic compounds in the water, ensuring high purity levels.

2. What is the role of the ANP in the ultrapure water production system?
The ANP is responsible for removing hydrogen peroxide from the fluid, further enhancing water quality.


==Original Abstract Submitted==

disclosed are ultrapure water production systems, semiconductor processing systems, and semiconductor fabrication methods. an ultrapure water production system may include a front filtering part that filters a fluid and a rear filtering part that filters the fluid released from the front filtering part. the rear filtering part may include a uv irradiator that irradiates a uv ray to the fluid to remove an organic material from the fluid, an anp that removes hydrogen peroxide from the fluid released from the uv irradiator, a connection line that connects the uv irradiator to the anp, a hydrogen peroxide detector that is on the connection line and detects a concentration of hydrogen peroxide in the fluid released from the uv irradiator, and a do detector between the hydrogen peroxide detector and the anp to measure a concentration of dissolved oxygen in the fluid released from the uv irradiator.



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