View source for Samsung electronics co., ltd. (20240203688). APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING FOCUSED ION BEAM AND SCANNING ELECTRON MICROSCOPE SUPPORTED BY ELECTRON DIFFRACTION PATTERN simplified abstract

=APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING FOCUSED ION BEAM AND SCANNING ELECTRON MICROSCOPE SUPPORTED BY ELECTRON DIFFRACTION PATTERN=


==Organization Name==

[[:Category:samsung electronics co., ltd.|samsung electronics co., ltd.]]


[[Category:samsung electronics co., ltd.]]

==Inventor(s)==

[[:Category:Kunsu Kim of SUWON-SI (KR)|Kunsu Kim of SUWON-SI (KR)]][[Category:Kunsu Kim of SUWON-SI (KR)]]

==APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING FOCUSED ION BEAM AND SCANNING ELECTRON MICROSCOPE SUPPORTED BY ELECTRON DIFFRACTION PATTERN - A simplified explanation of the abstract==


This abstract first appeared for US patent application 20240203688 titled 'APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING FOCUSED ION BEAM AND SCANNING ELECTRON MICROSCOPE SUPPORTED BY ELECTRON DIFFRACTION PATTERN

The apparatus for manufacturing semiconductor devices includes an electron gun, an ion beam device, and a detector.

* The electron gun generates an input electron beam to irradiate the sample.
* The ion beam device generates an ion beam to irradiate the sample.
* The detector, which includes an electron backscatter diffraction detector, detects emitted electrons from the sample simultaneously when irradiated by the ion beam.

Potential Applications:
- Semiconductor device manufacturing
- Material analysis in research and development
- Quality control in semiconductor production

Problems Solved:
- Efficient and simultaneous detection of emitted electrons during ion beam irradiation
- Enhanced analysis of sample properties

Benefits:
- Improved accuracy in material analysis
- Streamlined semiconductor device manufacturing processes
- Enhanced quality control measures

Commercial Applications:
Title: Advanced Semiconductor Device Manufacturing Apparatus
This technology can be used in semiconductor manufacturing facilities to improve production processes, enhance material analysis capabilities, and ensure high-quality output. The market implications include increased efficiency, improved product quality, and potential cost savings for manufacturers.

Frequently Updated Research:
Researchers are continually exploring ways to optimize the performance of electron guns, ion beam devices, and detectors in semiconductor manufacturing processes. Stay updated on the latest advancements in material analysis techniques and quality control measures.

Questions about Semiconductor Device Manufacturing Apparatus:
1. How does the electron backscatter diffraction detector improve the analysis of emitted electrons during ion beam irradiation?
The electron backscatter diffraction detector allows for simultaneous detection of emitted electrons, providing more accurate and detailed information about the sample properties.

2. What are the key differences between using an electron gun and an ion beam device in semiconductor device manufacturing?
The electron gun generates an input electron beam for irradiation, while the ion beam device generates an ion beam. Each has its unique advantages and applications in the manufacturing process.


==Original Abstract Submitted==

an apparatus for manufacturing semiconductor devices is disclosed. the apparatus includes an electron gun configured to generate an input electron beam and irradiate a sample with the input electron beam, an ion beam device configured to generate an ion beam and irradiate the sample with the ion beam, and a detector configured to detect emitted electrons from the sample. the detector includes an electron backscatter diffraction detector and detects the emitted electrons simultaneously when the sample is irradiated by the ion beam.



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