View source for SUBSTRATE PROCESSING METHOD: abstract simplified (17994181)

*This abstract for appeared for patent application  number 17994181 Titled 'SUBSTRATE PROCESSING METHOD'

==Simplified Explanation==

The abstract describes a method for processing a substrate. The method involves three steps: first, a silicon film is formed on the substrate. Then, the silicon film is irradiated with microwaves. Finally, the silicon film is soaked in liquid heavy water.


==Original Abstract Submitted==

A substrate processing method includes; forming a silicon film on a substrate, irradiating the silicon film with microwaves, and soaking the silicon film in liquid heavy water.